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Excimer lasers for DUV lithography
Technical Digest. Summaries of Papers Presented at the Conference on Lasers and Electro-Optics. Conference Edition. 1998 Technical Digest Series, Vol.6 (IEEE Cat. No.98CH36178), 1998Summary form only given. The use of KrF and ArF excimer lasers as exposure sources for deep ultraviolet (DUV) lithography is discussed. Driven by extreme demands on performance, these lasers continually push the state-of-the-art in excimer laser design. Past, present, and future performance characteristics for these lasers are presented.
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Ultrathin DUV resists for logic applications
SPIE Proceedings, 2002Ultrathin ESCAP resists have been examined for logic applications in our paper. Lithographic studies have been carried out with these resists at the thickness of 60, 120 and 400 nm for contacts, and at the thickness of 250 vs 400nm for gate layer applications. A clear relationship between optimization of resist profile and film thickness through design
James W. Thackeray +4 more
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Determination of optical constants in DUV/VUV
Chinese Optics Letters, 2013An approach for determining the optical constants of the weakly absorbing substrate is developed and applied to obtain the parameters of CaF2 and fused silica substrates in deep ultraviolet (DUV) and vacuum ultraviolet (VUV) range. A method for extracting the optical constants of thin films deposited on strongly absorbing substrate, which is based on ...
Chun Guo +5 more
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DUV laser lithography for photomask fabrication
SPIE Proceedings, 2003In the recent past significant work has been done to isolate and characterize suitable single layer Chemically Amplified Resist (CAR) systems for DUV printing applicable to photomask fabrication. This work is complicated by the inherent instability of most DUV CAR systems, particularly in air, showing unacceptable CD degradation over the normal ...
Curt A. Jackson +7 more
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Impact of DUV exposure on reticle repairs
SPIE Proceedings, 2005The reticle manufacturing process induces various defects on the mask that need to be repaired. Missing absorber or clear defects are often repaired by depositing a carbon-based material (depo) using a Focused Ion Beam (FIB) tool. Few cases of such depo repairs on defects in between nested contacts on attenuated phase shift masks were found to fail ...
Vikram L. Tolani +4 more
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Optical Coatings for the DUV / VUV
2003During the last two decades, the development of powerful UV light sources, especially excimer lasers and frequency multiplied solid state lasers has lead to growing research efforts in the field of UV photon application. One of the main drivers toward the shortest possible wavelengths in the vacuum ultraviolet spectral region is semiconductor ...
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Surface assessment and mitigation of DUV optics
SPIE Proceedings, 2015CaF 2 is one of the foremost optical materials used in ArF excimer laser optics. Surface quality of optically finished CaF 2 plays an important role in the component’s lifetime. Several techniques were employed to assess surface quality of optically finished CaF 2 in terms of top surface and subsurface damage, resulting in subsurface-damagefree CaF ...
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Recent advances of inorganic phosphates with UV/DUV cutoff edge and large second harmonic response
Chinese Journal of Structural Chemistry, 2023Chen Zhaohui
exaly