Results 211 to 220 of about 17,804 (263)

Electrochemical Etching of Crystalline Quartz

Electrochemical and Solid-State Letters, 2009
We present a method to electrochemically etch crystalline quartz. Electrochemical etching has not been previously explored as a method for processing quartz because of its insulating nature. By injecting energetic charge carriers into the quartz it can be made temporarily conductive, allowing currents which will affect the chemical etch rate.
E. Rodrigue, V. Kaajakari
openaire   +1 more source

Electrochemical pore etching in Ge

physica status solidi (a), 2003
61.43.Gt, 68.37.Hk, 81.65.Cf, 82.45.Vp Nucleation and growth of electrochemically obtained pores on (111) and (100) oriented n-Ge in different electrolytes was investigated. On rough surfaces pore density increases as the current density increases, whereas on smooth surfaces the situation is inverse, i.e., the pore density increases as the current ...
S. Langa, M. Christophersen, J. Carstensen, I. M. Tiginyanu, H. Föll   +4 more
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Electrochemical etching and profiling of silicon

Applied Surface Science, 1993
Abstract The dissolution behavior of silicon under high anodic polarization in buffered electrolyte with low fluoride content (≤ 0.1 mol dm -3 ) has been studied to determine an appropriate etching condition for the depth profiling of silicon structures.
T.S. Horányi, P. Tüttö
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Electrochemical pore etching in Ge

Materials Science in Semiconductor Processing, 2006
Abstract While electrochemical pore etching in semiconductors has become a thriving field for research and applications in the past 15 years or so, little work has been done in Ge. Besides Si, Ge is the only semiconductor with a minority carrier diffusion length large enough to enable the use of backside illumination, which has proved to be the ...
F. Cheng, J. Carstensen, H. Föll
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Electrochemical local etching of silicon in etchant vapor

Nanoscale, 2020
Electrochemical local etching of Si by applying an electric field and condensing etchant meniscus.
Bugeun Ki, Keorock Choi, Kyunghwan Kim, Jungwoo Oh   +3 more
openaire   +2 more sources

The frequency response of electrochemical etching

Nuclear Tracks and Radiation Measurements (1982), 1982
Abstract The response of electrochemical etching (ECE) in the frequency range up to 1 MHz has been studied. Measurements were made of the track density and the track diameter caused by alpha particles in polycarbonate (PC) samples. The samples of thickness ∽300 μm were irradiated with low-energy alpha particles from a depleted uranium source and then
C.F. Wong, L. Tommasino
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Electrochemical Tunnel Etching of Aluminum

Journal of The Electrochemical Society, 1984
Anodic dissolution of aluminum in hot chloride solutions produces a high density of fine etch tunnels that extend along [100] directions. Tunnels evolve from cubic etch pits when all but one of the pit wall surfaces become passivated; dissolution then occurs at the one active face at a rate that may initially be as high as 20 A/cm2. Tunnels have square
R. S. Alwitt, H. Uchi, T. R. Beck, R. C. Alkire   +3 more
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Machine for electrochemical etch stop

SPIE Proceedings, 2001
The configurations of electrochemical silicon etch-stop are discussed in this paper. An electrochemical etching machine with software and hardware, which can control the etching process of silicon very well, is designed and fabricated bas don the theory of electrochemical etching.
Kun Zhou, Mujie Lan, Weiping Chen, Donghong Wang   +3 more
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ELECTROCHEMICAL ETCHING REGISTRATION AND TRACK FORMATION TIME

Nuclear Tracks, 1981
ABSTRACT The registration efficiency of electrochemically etched nuclear track detectors is highly dependent on the track-formation time. Surface defects leading to background spots start forming trees since the beginning of the etching and they may propagate extensively if the track formation is not fast enough.
G. Espinosa Garcia, J.I. Galzarri, L. Tommasino, F. Raponi   +3 more
openaire   +1 more source

Note: Electrochemical etching of sharp iridium tips

Review of Scientific Instruments, 2011
We describe an etching procedure for the production of sharp iridium tips with apex radii of 15–70 nm, as determined by scanning electron microscopy, field ion microscopy, and field emission measurements. A coarse electrochemical etch followed by zone electropolishing is performed in a relatively harmless calcium chloride solution with high success ...
Jean-Benoît, Lalanne, William, Paul, David, Oliver, Peter H, Grütter   +3 more
openaire   +2 more sources