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Nanotips by reverse electrochemical etching

Applied Physics Letters, 1992
A simple, two-stage procedure is shown to produce slender and ultrasharp tungsten tips of nanometer and subnanometer apex dimensions (nanotips). Tip sharpening is achieved by electrochemical etching through bubble dynamics induced by ac voltage in a novel configuration in which the wire end is oriented upward.
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Electrochemical Etching Methods for Producing Porous Silicon

2015
Porous silicon produced by electrochemical etching of silicon has become one of the most popular materials used in many scientific disciplines as a result of its outstanding and unique set of chemical and physical properties and cost-competitive fabrication processes.
Santos, Abel, Kumeria, Tushar
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Electrochemical etching of silicon in aqueous solutions

SPIE Proceedings, 1999
The increase in the etching rate of both n- and p-type silicon was obtained under cathodic biasing in alkaline solutions. In the case of n-silicon the acceleration of the etching rate in dark was found to be markedly enhanced by illumination. The high rate of etching of p-silicon at cathodically applied voltage was obtained only with illumination. When
David Starosvetsky   +2 more
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Fabrication of porous emitters for ionic liquid ion source by wire electrical discharge machining combined with electrochemical etching.

Review of Scientific Instruments, 2019
Ionic liquid ion source (ILIS) is a promising ion source, which can be applied to space propulsion, microfabrication, and surface modification. Fabrication of high-quality ILIS emitters is one of the key technologies for the application of ILIS.
Xinyu Liu   +3 more
semanticscholar   +1 more source

Fabrication of Sharp Gold Tips by Three-Electrode Electrochemical Etching with High Controllability and Reproducibility

Journal of Physical Chemistry C, 2018
Gold (Au) tips have wide application in local spectroscopies not only because of their high chemical stability but also their strong localized surface plasmon resonance (LSPR) in the visible and near-infrared regions.
Bo Yang   +3 more
semanticscholar   +1 more source

On the sparkable region phenomena in electrochemical etching

Nuclear Tracks and Radiation Measurements, 1993
It was observed by Hassib, et al., that, for electrochemical etching of a given alpha energy, a layer has to be removed from the detector surface to reach a defined region. At this region, the track geometry is quite suitable to be sparked when applying the electric field.
G.M. Hassib, H.A. Amer
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Digital Electrochemical Etching of Compound Semiconductors

MRS Proceedings, 1991
AbstractThe principles for an electrochemical digital etching method for compound semiconductors are described and initial results reported. The method is designed to allow atomic level control over the etching process, resulting in the removal of a bilayer of the compound for each cycle.
Q. Paula Lei, John L. Stickney
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A STUDY OF THE BASIC PROPERTIES OF ELECTROCHEMICAL TRACK ETCHING

Radiation Effects, 1977
The basic properties of the electrochemical track etching method proposed by Tommasino were studied for PC and PET foils irradiated with fission fragments and/or alpha-particles. Etching was performed in a specially designed double-wall vessel applying electric fields of different strengths and frequencies, The variation in the diameters of the ...
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Synthesis of Ti3C2Fx MXene with controllable fluorination by electrochemical etching for lithium-ion batteries applications

, 2021
Teng Yin   +8 more
semanticscholar   +1 more source

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