Results 281 to 290 of about 848,999 (311)
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Digital Electrochemical Etching of Compound Semiconductors
MRS Proceedings, 1991AbstractThe principles for an electrochemical digital etching method for compound semiconductors are described and initial results reported. The method is designed to allow atomic level control over the etching process, resulting in the removal of a bilayer of the compound for each cycle.
Q. Paula Lei, John L. Stickney
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Electrochemical etching and profiling of silicon
Applied Surface Science, 1993Abstract The dissolution behavior of silicon under high anodic polarization in buffered electrolyte with low fluoride content (≤ 0.1 mol dm -3 ) has been studied to determine an appropriate etching condition for the depth profiling of silicon structures.
T.S. Horányi, P. Tüttö
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The frequency response of electrochemical etching
Nuclear Tracks and Radiation Measurements (1982), 1982Abstract The response of electrochemical etching (ECE) in the frequency range up to 1 MHz has been studied. Measurements were made of the track density and the track diameter caused by alpha particles in polycarbonate (PC) samples. The samples of thickness ∽300 μm were irradiated with low-energy alpha particles from a depleted uranium source and then
C.F. Wong, L. Tommasino
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P6H-1 Electrochemical Etching of Quartz
2007 IEEE Ultrasonics Symposium Proceedings, 2007We present the first results on the electrochemical etching of crystalline quartz. Used for bulk micromachining of silicon, electrochemical etching has not been previously explored as a method for processing quartz because of its insulating nature. By injecting energetic charge carriers into the quartz it can be made temporarily conductive, allowing ...
E. Rodrigue, V. Kaajakari
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Review of Scientific Instruments, 2019
Ionic liquid ion source (ILIS) is a promising ion source, which can be applied to space propulsion, microfabrication, and surface modification. Fabrication of high-quality ILIS emitters is one of the key technologies for the application of ILIS.
Xinyu Liu +3 more
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Ionic liquid ion source (ILIS) is a promising ion source, which can be applied to space propulsion, microfabrication, and surface modification. Fabrication of high-quality ILIS emitters is one of the key technologies for the application of ILIS.
Xinyu Liu +3 more
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Self-Limiting Electrochemical Emitter Etch Back
201126th European Photovoltaic Solar Energy Conference and Exhibition; 2135 ...
Klingbeil, S., Fath, P., Reuter, M.
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Electrochemical etching of titanium alloy castings
Journal of Applied Electrochemistry, 1984We used an electrochemical method to etch cast binary titanium alloys in an attempt to show their dendritic structures.Studies showed that when an alloy could be activated in either sulphuric, oxalic or fluosilicic acid, its anodic polarization curve had the same general shape and passivation potential for all alloys independent of alloying element or ...
J. C. Griess, S. A. David, R. J. Gray
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Universal multidetector etching stand for electrochemically etched plastic track detectors
International Journal of Radiation Applications and Instrumentation. Part D. Nuclear Tracks and Radiation Measurements, 1992Abstract An etching stand for electrochemically etched track detectors is described. It has been developed for the treatment of any plastics of arbitrary thickness, either at room or at elevated temperatures. Its simple construction and handling enable one to etch from tens to hundreds of detectors of variable shapes and dimensions simultaneously ...
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Mesoporous Germanium Formation by Electrochemical Etching
Journal of The Electrochemical Society, 2009Weight reduction of multi-junction III-V semiconductor solar cells is an important budget issue for space applications. Typically, space solar cells are epitaxially formed on a Ge or GaAs substrate wafer. The substrate material determines the lattice constant of the stack, provides mechanical stability during the cell process, and serves as bottom cell.
E. Garralaga Rojas +7 more
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