Results 81 to 90 of about 18,795 (259)
Analysis and applications of a heralded electron source
We analytically describe the noise properties of a heralded electron source made from a standard electron gun, a weak photonic coupler, a single photon counter, and an electron energy filter.
Stewart A Koppell +5 more
doaj +1 more source
Directed self-assembly (DSA) lithography, a cutting-edge technology based on the self-assembly of block copolymers (BCPs), has received significant attention in recent years.
Xiuyan Cheng +7 more
doaj +1 more source
Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography. [PDF]
Zhang S +10 more
europepmc +1 more source
Gate‐Induced Critical Current Modulation in W–C Nanowires: The Role of Fabrication
Focused ion beam induced deposition (FIBID) enables precise control of superconducting W–C nanowire devices. Introducing a Ga+ focused ion beam (FIB) cleaning step reduces substrate damage and suppresses leakage currents, shifting gating thresholds to higher voltages.
Alba Arroyo‐Fructuoso +2 more
wiley +1 more source
Influence of MeV H+ ion beam flux on cross-linking and blister formation in PMMA resist [PDF]
In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam.
Somrit Unai
doaj
This article highlights the development of robust and high‐performance flexible and stretchable biosensors that maintain long‐term functionality and optimal electrical conductivity under mechanical deformation, utilizing sustainable and cost‐effective manufacturing principles.
Mousa H. Aldosari, Ahyeon Koh
wiley +1 more source
Direct Patterning of CsPbBr3 Nanocrystals via Electron-Beam Lithography. [PDF]
Dieleman CD +4 more
europepmc +1 more source
Aerosol Jet Printing (AJP) has emerged as a versatile additive manufacturing technique for high‐resolution, conformal, and multi‐material printing. This review highlights advances in printable materials, substrate compatibility, post‐processing, characterization, and process innovations, while critically discussing current challenges and future ...
Chandrachur Chatterjee +2 more
wiley +1 more source
In recent years, the field of micro- and nanochannel fabrication has seen significant advancements driven by the need for precision in biomedical, environmental, and industrial applications.
Koosha Karimi +5 more
doaj +1 more source
Ice-assisted electron-beam lithography for MoS2 transistors with extremely low-energy electrons. [PDF]
Yao G, Zhao D, Hong Y, Zheng R, Qiu M.
europepmc +1 more source

