Results 81 to 90 of about 18,755 (260)

Chemically Amplified Molecular Glass Photoresist Regulated by 2-Aminoanthracene Additive for Electron Beam Lithography and Extreme Ultraviolet Lithography. [PDF]

ACS Omega, 2023
Zhang S, Chen L, Gao J, Cui X, Cong X, Guo X, Hu R, Wang S, Chen J, Li Y, Yang G.   +10 more
europepmc   +1 more source

The Evolution of Aerosol Jet Printing, A Review: Enhancing Material Versatility and Improvements for Next‐Generation Applications

Advanced Materials Technologies, EarlyView.
Aerosol Jet Printing (AJP) has emerged as a versatile additive manufacturing technique for high‐resolution, conformal, and multi‐material printing. This review highlights advances in printable materials, substrate compatibility, post‐processing, characterization, and process innovations, while critically discussing current challenges and future ...
Chandrachur Chatterjee, Rocco Lupoi, Michael J. Gibbons   +2 more
wiley   +1 more source

Review of Directed Self-Assembly Material, Processing, and Application in Advanced Lithography and Patterning

Micromachines
Directed self-assembly (DSA) lithography, a cutting-edge technology based on the self-assembly of block copolymers (BCPs), has received significant attention in recent years.
Xiuyan Cheng, Di Liang, Miao Jiang, Yufei Sha, Xiaonan Liu, Jinlai Liu, Qingchen Cao, Jiangliu Shi   +7 more
doaj   +1 more source

Non‐Volatile Silicon Mach‐Zehnder Switches with 0.7 π Phase Shift Based on Graphene Heaters and Sb2Se3 Phase Change Material

Advanced Optical Materials, EarlyView.
ABSTRACT Photonic integrated circuits (PICs) can deliver unparalleled performance for future neuromorphic computing applications. Such neuromorphic PICs require a large number of tunable switches, which are typically realized with current‐controlled heaters, resulting in considerable energy consumption.
Jens Samland, Felix Hoff, Timo Veslin, Holger Lerch, Bartos Chmielak, Martin Otto, Caroline Porschatis, Bárbara Canto, Stephan Suckow, Matthias Wuttig, Max C. Lemme   +10 more
wiley   +1 more source

Analysis and applications of a heralded electron source

New Journal of Physics
We analytically describe the noise properties of a heralded electron source made from a standard electron gun, a weak photonic coupler, a single photon counter, and an electron energy filter.
Stewart A Koppell, John W Simonaitis, Maurice A R Krielaart, William P Putnam, Karl K Berggren, Phillip D Keathley   +5 more
doaj   +1 more source

Influence of MeV H+ ion beam flux on cross-linking and blister formation in PMMA resist [PDF]

Maejo International Journal of Science and Technology, 2012
In soft lithography, a pattern is produced in poly(dimethylsiloxane) (PDMS) elastomer by casting from a master mould. The mould can be made of poly(methylmethacrylate) (PMMA) resist by utilising either its positive or negative tone induced by an ion beam.
Somrit Unai
doaj  

Direct Patterning of CsPbBr₃ Nanocrystals via Electron-Beam Lithography. [PDF]

ACS Appl Energy Mater, 2022
Dieleman CD, van der Burgt J, Thakur N, Garnett EC, Ehrler B.   +4 more
europepmc   +1 more source

Chip‐Integrated Metasurface‐GaAsSb Nanowire Array Photodetectors for Single‐Pixel Polarimetric Imaging

Advanced Optical Materials, EarlyView.
A 2×2 multiplexed GaAsSb nanowire photodetector array integrated with L‐shaped metasurfaces is developed for miniaturized infrared polarimetry. Leveraging non‐radiating anapole states that facilitate near‐field enhancement, the device demonstrates strong polarization selectivity at 835 nm.
Longsibo Huang, Ziyuan Li, Yitao Yang, Yang Yu, Lei Xu, Li Li, Songqin Zhang, Han Wang, Wenwu Pan, Chaohao Chen, Weiqi Jin, Wen Lei, Lorenzo Faraone, Chennupati Jagadish, Lan Fu   +14 more
wiley   +1 more source

Ice-assisted electron-beam lithography for MoS₂ transistors with extremely low-energy electrons. [PDF]

Nanoscale Adv, 2022
Yao G, Zhao D, Hong Y, Zheng R, Qiu M.
europepmc   +1 more source

Surface‐Plasmon‐Coupled Blue InGaN/GaN Micro‐LEDs with Oxide–Metal–Oxide Capping Layer Compatible to Chip Fabrication Process

Advanced Optical Materials, EarlyView.
A sidewall‐integrated oxide–metal–oxide architecture is demonstrated to overcome efficiency degradation in ultra‐small InGaN/GaN micro‐LEDs. Conformal Al2O3 passivation combined with plasmonic Ag nanoparticles enables localized surface plasmon–exciton coupling, converting surface‐related nonradiative losses into radiative emission.
Pil‐Kyu Jang, Lee‐Woon Jang, Ohbin Kwon, Yeong‐Hoon Cho, Sangbum Kim, Sang‐Ik Lee, Seungjae Baek, Jiwon Park, Myeongjun Choi, Jaeseung Kim, Taehwan Kim, Sung‐Un Kim, Min‐Seok Lee, Yong‐Ho Ra, Ki Hoon Nam, Seung Min Kwak, Alexander Y. Polyakov, In‐Hwan Lee   +17 more
wiley   +1 more source