Results 11 to 20 of about 110,116 (295)

Shear bond strength between porcelain and nano filler composite resin with or without 9% hydrofluoric acid etching

open access: yesDental Journal, 2009
Background: Reparation technique on restorations with broken or damaged porcelain which are still attached with the teeth are difficult, because it is very hard to remove the porcelain restoration without damaging it, and it needs a long time.
Kun Ismiyatin
doaj   +1 more source

Surface Recombination and Space-Charge-Limited Photocurrent-Voltage (PC-V) Measurements in (Cd,Mn)Te Samples–Kinetics of Photocurrent (PC)

open access: yesSensors, 2022
Photocurrent-voltage characteristic (PC-V) is a method of determining the critical parameter in X-ray and gamma-ray detector plates, i.e., the carrier mobility-lifetime product, μτ.
Andrzej Mycielski   +12 more
doaj   +1 more source

DNA Strand Patterns on Aluminium Thin Films

open access: yesSensors, 2011
A new patterning method using Deoxyribose Nucleic Acid (DNA) strands capable of producing nanogaps of less than 100 nm is proposed and investigated in this work.
Fatemeh Shahhosseini   +5 more
doaj   +1 more source

Efficiency enhancement of Cu2ZnSnS4 solar cells via surface treatment engineering [PDF]

open access: yesRoyal Society Open Science, 2018
Pure-sulphide Cu2ZnSnS4 (CZTS) thin film solar cells were prepared by a low-cost, non-toxic and high-throughput method based on the thermal decomposition and reaction of sol–gel precursor solution, followed by a high temperature sulfurization process in ...
Rongrong Chen   +4 more
doaj   +1 more source

Silicon Wafer Etching Rate Characteristics with Burst Width Using 150 kHz Band High-Power Burst Inductively Coupled Plasma

open access: yesMicromachines, 2021
The high-speed etching of a silicon wafer was experimentally investigated, focusing on the duty factor of 150 kHz band high-power burst inductively coupled plasma.
Hisaki Kikuchi   +4 more
doaj   +1 more source

Atomic Layer Etching: Rethinking the Art of Etch [PDF]

open access: yesThe Journal of Physical Chemistry Letters, 2018
Atomic layer etching (ALE) is the most advanced etching technique in production today. In this Perspective, we describe ALE in comparison to long-standing conventional etching techniques, relating it to the underlying principles behind the ancient art of etching.
Keren J. Kanarik   +2 more
openaire   +3 more sources

Fabrication of Pyramid Structure Substrate Utilized for Epitaxial Growth Free-Standing GaN

open access: yesCrystals, 2019
Metal−organic chemical vapor deposition (MOCVD)-grown GaN on sapphire substrate was etched by hot phosphoric acids. Pyramid structures were obtained in the N-polar face of the MOCVD−GaN.
Ruixian Yu   +7 more
doaj   +1 more source

Low-Cost Online Monitoring System for the Etching Process in Fiber Optic Sensors by Computer Vision

open access: yesSensors, 2023
The present research exposes a novel methodology to manufacture fiber optic sensors following the etching process by Hydrofluoric Acid deposition through a real-time monitoring diameter measurement by computer vision.
Wenceslao Eduardo Rodríguez-Rodríguez   +5 more
doaj   +1 more source

Effect of Substrate-Thickness on Voltage Responsivity of MEMS-Based ZnO Pyroelectric Infrared Sensors

open access: yesApplied Sciences, 2021
Pyroelectric infrared sensors incorporating suspended zinc oxide (ZnO) pyroelectric films and thermally insulated silicon substrates are fabricated using conventional MEMS-based thin-film deposition, photolithography, and etching techniques.
Chia-Yen Lee   +3 more
doaj   +1 more source

Silicon flower structures by maskless plasma etching

open access: yesHeliyon, 2023
Silicon nano/microstructures are widely utilized in the semiconductor industry, and plasma etching is the most prominent method for fabricating silicon nano/microstructures.
Geng Zhao   +6 more
doaj  

Home - About - Disclaimer - Privacy