Results 41 to 50 of about 529,742 (380)
Ultranarrow conducting channels defined in GaAs-AlGaAs by low-energy ion damage [PDF]
, 1987 We have laterally patterned the narrowest conducting wires of two-dimensional electron gas (2DEG) material reported to date. The depletion induced by low-energy ion etching of GaAs-AlGaAs 2DEG structures was used to define narrow conducting channels.
Beebe, E. D. +5 more
core +1 more source
Microsystems & Nanoengineering, 2019 Microneedle technologies have the potential for expanding the capabilities of wearable health monitoring from physiology to biochemistry. This paper presents the fabrication of silicon hollow microneedles by a deep-reactive ion etching (DRIE) process ...
Yan Li +8 more
semanticscholar +1 more source
Metal etching composition [PDF]
, 1991 The present invention is directed to a chemical etching composition for etching metals or metallic alloys. The composition includes a solution of hydrochloric acid, phosphoric acid, ethylene glycol, and an oxidizing agent.
Foster, Robert E. +2 more
core +1 more source
Atomic layer etching of SiO2 with Ar and CHF 3 plasmas: A self-limiting process for aspect ratio independent etching [PDF]
, 2019 With ever increasing demands on device patterning to achieve smaller critical dimensions, the need for precise, controllable atomic layer etching (ALE) is steadily increasing.
Cabrini, S +8 more
core +1 more source
The IQ‐compete assay for measuring mitochondrial protein import efficiencies in living yeast cells
FEBS Letters, EarlyView.The efficiency of mitochondrial protein import depends on the properties of the newly synthesized precursor proteins. The Import and de‐Quenching Competition (IQ‐compete) assay is a novel method to monitor the import efficiency of different proteins by fluorescence in living yeast cells.
Yasmin Hoffman +3 more
wiley +1 more source
Dental Research Journal, 2018 Background: The purpose of the study was to evaluate and to compare the shear bond strength (SBS), adhesive remnant index, and surface roughness of the samples bonded after etching with phosphoric acid and erbium, chromium-doped: Yttrium scandium-gallium-
S Dilip +5 more
doaj +1 more source
Development of technology for the process of neutralization of pickling solution of metallurgical production [PDF]
Научно-технический вестник Брянского государственного университета, 2016 The leading branch of territorial-production complex of Russia - mechanical engineering. Companies of the industry throw dirt in the form of used organic solvents, toxic compounds of metals with waste galvanic and etching solutions, cutting fluids ...
Lamzina I.V. +2 more
doaj +1 more source
Ultrasonic metal etching for metallographic analysis [PDF]
, 1971 Ultrasonic etching delineates microstructural features not discernible in specimens prepared for metallographic analysis by standard chemical etching procedures.
Young, S. G.
core +1 more source
Atomic process of oxidative etching in monolayer molybdenum disulfide
, 2017 The microscopic process of oxidative etching of two-dimensional molybdenum disulfide (2D MoS2) at an atomic scale is investigated using a correlative TEM-etching study.
Jin, Chuanhong +7 more
core +1 more source
Guidelines for etching silicon MEMS structures using fluorine high-density plasmas at cryogenic temperatures [PDF]
, 2002 This paper presents guidelines for the deep reactive ion etching (DRIE) of silicon MEMS structures, employing SF/sub 6//O/sub 2/-based high-density plasmas at cryogenic temperatures.
Boer, Meint J. de +6 more
core +2 more sources