Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication [PDF]
This paper reviews the recent advances in reaction-ion etching (RIE) for application in high-aspect-ratio microfabrication. High-aspect-ratio etching of materials used in micro- and nanofabrication has become a very important enabling technology ...
Michael Huff
doaj +6 more sources
Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review [PDF]
High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X ...
Lucia Romano, Marco Stampanoni
doaj +9 more sources
Gold etching for microfabrication [PDF]
The etching of gold is a key enabling technology in the fabrication of many microdevices and is widely used in the electronic, optoelectronic and microelectromechanical systems (MEMS) industries. In this review, we examine some of the available methods for patterning gold thin films using dry and wet etching techniques.
Todd Green
semanticscholar +9 more sources
Editorial for the Special Issue on Recent Advances in Reactive Ion Etching and Applications of High-Aspect-Ratio Microfabrication [PDF]
Reactive ion etching (RIE) is the dominating technology for micromachining semiconductors with a high aspect ratio (HAR) [...]
Lucia Romano, Konstantins Jefimovs
doaj +3 more sources
Atmospheric Gas-Phase Catalyst Etching of SiO2 for Deep Microfabrication Using HF Gas and Patterned Photoresist. [PDF]
Micro/nanoscale structure fabrication is an important process for designing miniaturized devices. Recently, three-dimensional (3D) integrated circuits using SiO2 via-holes interlayer filling by copper have attracted attention to extend the lifetime of ...
Sano KH+5 more
europepmc +4 more sources
High‐Aspect‐Ratio Grating Microfabrication by Platinum‐Assisted Chemical Etching and Gold Electroplating [PDF]
Diffractive optics play a key role in hard X‐rays imaging for which many scientific, technological, and biomedical applications exist. Herein, high‐aspect‐ratio microfabrication of gratings for X‐ray interferometry is demonstrated using Pt as a catalyst for the metal assisted chemical etching of Si in a solution of HF and H2O2.
Lucia Romano+3 more
semanticscholar +6 more sources
Microfabrication of high performance optical diaphragm by plasma ion beam etching technology [PDF]
This paper, “Microfabrication of high performance optical diaphragm by plasma ion beam etching technology," was presented as part of International Conference on Space Optics—ICSO 1997, held in Toulouse, France.
Agnes Mestreau+8 more
semanticscholar +3 more sources
AbstractAlthough hypodermic needles are a “gold standard” for transdermal drug delivery (TDD), microneedle (MN)‐mediated TDD denotes an unconventional approach in which drug compounds are delivered via micron‐size needles. Herein, an isotropic XeF2 dry etching process is explored to fabricate silicon‐based solid MNs.
Ismail Eş+3 more
semanticscholar +6 more sources
Microfabrication Technologies for Interaction Circuits of THz Vacuum Electronic Devices [PDF]
Advances in manufacturing technology are allowing for the realization of interaction circuit with microstructures. The capability to produce small circuit structures is allowing new opportunities for vacuum electronic devices producing terahertz (THz ...
Xinghui Li, Jinjun Feng
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Microfabrication of Si by KOH Etchant Using Etching Mask Amorphized by Ar Ion Beam [PDF]
We demonstrate the microfabrication of Si by KOH wet etching using a mask pattern amorphized by an ion beam as an etching mask. An electron cyclotron resonance ion shower system was used as an ion beam source of 100 to 1000 eV energy.
Mina Sato+2 more
openalex +2 more sources