Results 21 to 30 of about 118,840 (195)

Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review

Micromachines, 2020
High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X ...
Lucia Romano, Marco Stampanoni
doaj   +1 more source

SF6 Optimized O2 Plasma Etching of Parylene C

Micromachines, 2018
Parylene C is a widely used polymer material in microfabrication because of its excellent properties such as chemical inertness, biocompatibility and flexibility.
Lingqian Zhang, Yaoping Liu, Zhihong Li, Wei Wang   +3 more
doaj   +1 more source

Detachable three-layer Au absorber microfabrication for low-temperature detectors

Micro and Nano Engineering, 2023
Low temperature detectors (LTDs) used for decay energy spectrometry (DES) can provide accurate and reliable decay data thanks to their high-energy resolution and a near 100% detection efficiency for the radiations of interest. However, it is essential to
Jawad Hadid, Matias Rodrigues, Abdelmounaim Harouri, Christophe Dupuis, David Bouville, Antoine Martin, Martin Loidl, Laurence Ferlazzo   +7 more
doaj   +1 more source

Two-step hybrid process of movable part inside glass substrate using ultrafast laser

Micro and Nano Systems Letters, 2021
We demonstrate a two-step hybrid process for fabricating movable parts inside glass substrate using the selective laser-induced etching (SLE) process that is consisted of laser-direct writing and wet chemical etching.
Jeongtae Kim, Sung-Il Kim, Yeun-Ho Joung, Jiyeon Choi, Chiwan Koo   +4 more
doaj   +1 more source

Fabrication of Planar Microelectrode Array Using Laser-Patterned ITO and SU-8

Micromachines, 2021
For several decades, microelectrode array (MEA) has been a powerful tool for in vitro neural electrophysiology because it provides a unique approach for monitoring the activity of a number of neurons over time.
Hee Soo Jeong, Seoyoung Hwang, Kyou Sik Min, Sang Beom Jun   +3 more
doaj   +1 more source

Effects of Surface Microtopography on Wettability of Poly(dimethylsiloxane) Film: Superhydrophobicity [PDF]

علوم و تکنولوژی پلیمر, 2020
Hypothesis: Recent advances in micro- and nanotechnology have led to possible design of functional micro/nanostructured surfaces with micro/nanotopography features that can exhibit low adhesion properties.
Shayesteh Khakvand, Kiyumars Jalili, Fatemeh Hassanpour, Farhang Abbasi   +3 more
doaj   +1 more source

Manufacture of Three-Dimensional Optofluidic Spot-Size Converters in Fused Silica Using Hybrid Laser Microfabrication

Sensors, 2022
We propose a hybrid laser microfabrication approach for the manufacture of three-dimensional (3D) optofluidic spot-size converters in fused silica glass by a combination of femtosecond (fs) laser microfabrication and carbon dioxide laser irradiation ...
Jianping Yu, Jian Xu, Aodong Zhang, Yunpeng Song, Jia Qi, Qiaonan Dong, Jianfang Chen, Zhaoxiang Liu, Wei Chen, Ya Cheng   +9 more
doaj   +1 more source

Ultrafast fabrication of high-aspect-ratio macropores in P-type silicon: toward the mass production of microdevices

Materials Research Letters, 2018
Etching rate is a major concern for the effective mass production of high-aspect-ratio microstructures, especially in p-type silicon. In this work, controlled electrochemical growth of high-aspect-ratio (from 15 to 110) macropores in p-type silicon at ...
Daohan Ge, Wenbing Li, Le Lu, Jinxiu Wei, Xiukang Huang, Liqiang Zhang, Peter J. Reece, Shining Zhu, J. Justin Gooding   +8 more
doaj   +1 more source

ICP Etching of Silicon for Micro and Nanoscale Devices [PDF]

, 2010
The physical structuring of silicon is one of the cornerstones of modern microelectronics and integrated circuits. Typical structuring of silicon requires generating a plasma to chemically or physically etch silicon.
Henry, Michael David
core   +1 more source

naitsok/ultimate-psi-etching: Ultimate PSi Etching 2.0.2.5

, 2022
A NI LabVIEW-based software for electrochemical anodization of Si wafers. Features: Preistalled etching cells. Three different etching regimes: constant current, pulsed etching, and non-linear current. Preinstalled wafer liftoff pulses.
Konstantin Tamarov
core   +1 more source