Results 221 to 230 of about 189,870 (274)
Some of the next articles are maybe not open access.
Etching-assisted femtosecond laser microfabrication
Chinese Physics B, 2018Hong-Bo Sun +3 more
semanticscholar +4 more sources
Japanese Journal of Applied Physics, 2012 We demonstrated that bacterial cells can be used as a mask material for microfabrication of GaAs and Si by a Cl2 inductively coupled plasma (ICP) etching process. The etching rate of Escherichia coli cells was similar to that of electron beam resist or nanoimprint resist. We also demonstrated the degradation of bacterial cells by low-pressure plasma
Akihiro Matsutani, Ayako Takada
openalex +3 more sources
Applied Surface Science, 2002 Abstract High aspect-ratio (more than 10) microfabrication of crosslinked polytetrafluoroethylene (PTFE) has been carried out using synchrotron radiation (SR) direct photo-etching. The etching rates of crosslinked PTFE samples with various crosslinked densities were studied by changing photon fluence of SR at different sample temperatures.
T. Katoh +6 more
openalex +3 more sources
3D microfabrication in YAG crystals by direct laser writing and chemical etching
2013 Conference on Lasers and Electro-Optics Pacific Rim (CLEOPR), 2013We report selective etching of mm-length direct laser written three-dimensional microstructures inside Nd:YAG crystals. The structures exhibit enhanced etching selectivity compared to unmodified YAG. Origin of this selectivity is investigated using Nd3+ micro-spectroscopy and micro-Raman.
Debaditya Choudhury +4 more
openaire +3 more sources
Si etching in high-density SF6 plasmas for microfabrication: surface roughness formation
Microelectronic Engineering, 2004 Silicon etching and Si surface-roughness formation in high density SF 6 plasmas was studied. Etching rates and surface roughness were measured and correlated with ion flux and neutral F atom flux measured in situ. Etching rates are an increasing function of F atom flux, while surface roughness is not a monotonic function of F atom flux, or the etching
Εvangelos Gogolides
openalex +3 more sources
Microfabrication by Laser Lithography Combined with Ion Etching
2018Ruoqiu Wang, Donglin Xue, Zhiyu Zhang
openaire +3 more sources
Plasma-Assisted Etching in Microfabrication [PDF]
Annual Review of Materials Science, 1983 It has long been recognized that a molecular gas glow discharge is a prolific source of chemically active radicals. However, it was not until the last twenty years or so that glow discharges were used to provide active radicals for the etching of solid materials.
J. W. Coburn, Harold F. Winters
openaire +1 more source
Microfabrication for Si wafers by FAB etching
Applied Surface Science, 1993Abstract Fast atom beam (FAB) etching is useful for microfabrication of insulators or composite materials with metals and semiconductors because of the electric neutral property. The FAB source for a large diameter of (8 inch) FAB has been developed and the characteristics have been studied by spectroscopic and other methods.
H. Suzuki, T. Satake, T. Nishimura
openaire +2 more sources
Microfabrication of Glassy Carbon by Electrochemical Etching
Journal of The Electrochemical Society, 2004Due to the broad impact of microfabrication technology on chemistry and biology, new methods to pattern and etch a variety of materials are being explored in a number of laboratories. We have developed a method for the etching of glassy carbon (GC) that opens pathways for the creation of new electrode patterns and devices.
Mark T. McDermott +2 more
openaire +2 more sources