Results 201 to 210 of about 18,262 (225)
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Silicon Microfabrication: Laser Ablation vs. Inductively Coupled Plasma (ICP) Etch
MRS Proceedings, 2001AbstractMechanical prototypes of a silicon interposer device, having high-aspect ratio straight walls, were required for experiments to qualify various packaging assembly options. The ideal solution would yield expendable, quickly made, and relatively inexpensive replica parts.This need led to the investigation of micromachining of silicon via laser ...
Megan M. Owens +2 more
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Microfabrication of plasma nanotorch tips for localized etching and deposition
2010 IEEE Sensors, 2010We present the microfabrication and initial testing of an AFM-tip like device, or nanotorch, that is capable of generating a very localized microplasma at its tip. The submicron region near its tip provides a unique manufacturing environment where new methods for controlled direct-write micro and nanofabrication can be tested.
null Yan Xie +3 more
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Microfabricated Deep-Etched Structures for ICF and Equation-of-State Targets
Fusion Science and Technology, 2009Microfabrication techniques, derived from the semiconductor industry, can be used to make a variety of useful mechanical components for targets.
Robin Miles +7 more
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Microfabrication of LiNbO3 by Reactive Ion-Beam Etching
Japanese Journal of Applied Physics, 1980The ratio of the etching rate of LiNbO3 to AZ1350 at normal incidence for CHF3 ion is about 5 times as large as that for Ar ion. This high ratio is utilized to fabricate LiNbO3 blazed gratings and also LiNbO3 guided wave optical elements such as grating couplers to demonstrate that reactive ion-beam etching is a very useful microfabrication ...
Shinji Matsui +3 more
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Japanese Journal of Applied Physics, 2012
We demonstrated that bacterial cells can be used as a mask material for microfabrication of GaAs and Si by a Cl2 inductively coupled plasma (ICP) etching process. The etching rate of Escherichia coli cells was similar to that of electron beam resist or nanoimprint resist. We also demonstrated the degradation of bacterial cells by low-pressure plasma
Akihiro Matsutani, Ayako Takada
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We demonstrated that bacterial cells can be used as a mask material for microfabrication of GaAs and Si by a Cl2 inductively coupled plasma (ICP) etching process. The etching rate of Escherichia coli cells was similar to that of electron beam resist or nanoimprint resist. We also demonstrated the degradation of bacterial cells by low-pressure plasma
Akihiro Matsutani, Ayako Takada
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New microfabrication technique on a submicrometer scale by synchrotron radiation-excited etching
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 1995Synchrotron radiation-excited etching of Si, SiC, and WO3 has been investigated using a noncontact mask with a pattern of submicrometer scale. The blank pattern of the mask was replicated on the etched surface, and highly area-selective etching was realized at the size of ∼0.4 μm.
Shingo Terakado +7 more
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3D microfabrication in YAG crystals by direct laser writing and chemical etching
2013 Conference on Lasers and Electro-Optics Pacific Rim (CLEOPR), 2013We report selective etching of mm-length direct laser written three-dimensional microstructures inside Nd:YAG crystals. The structures exhibit enhanced etching selectivity compared to unmodified YAG. Origin of this selectivity is investigated using Nd3+ micro-spectroscopy and micro-Raman.
Debaditya Choudhury +4 more
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Microfabrication and evaluation of diffractive optical filters prepared by reactive sputter etching
Journal of Applied Physics, 1979Single or linearly superimposed square-wave surface-relief patterns in a transparent plate yield optical transmission characteristics similar to those of interference filters. Reactive sputter etching of fused quartz in CHF3 using Shipley 1350 H photoresist as an etch mask offers a well-controlled method to produce these complex structures.
K. Knop, H. W. Lehmann, R. Widmer
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Etching-assisted femtosecond laser microfabrication
Chinese Physics B, 2018Monan Liu +3 more
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Si etching in high-density SF6 plasmas for microfabrication: surface roughness formation
Microelectronic Engineering, 2004Silicon etching and Si surface-roughness formation in high density SF 6 plasmas was studied. Etching rates and surface roughness were measured and correlated with ion flux and neutral F atom flux measured in situ. Etching rates are an increasing function of F atom flux, while surface roughness is not a monotonic function of F atom flux, or the etching
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