Results 231 to 240 of about 18,009 (279)

Transparent transfer-free multilayer graphene microelectrodes enable high quality recordings in brain slices

de Eulate NA, Pavlou C, González GL, Holzapfel L, Gao Z, Vollebregt S, Giagka V.   +6 more
europepmc   +1 more source

Experimental study of inductively coupled plasma etching of patterned single crystal diamonds. [PDF]

Sci Rep
Zhao L, Wang X, Jiang N, Nishimura K, Yi J, Fang S.   +5 more
europepmc   +1 more source

Novel Technique for Backside Alignment Using Direct Laser Writing. [PDF]

Micromachines (Basel)
Mitchell M, Sivaraya S, Bending SJ, Mohammadi A.   +3 more
europepmc   +1 more source

Transfer printing micro-assembly of silicon photonic crystal cavity arrays: beating the fabrication tolerance limit. [PDF]

Nat Commun
Bommer SP, Panuski C, Guilhabert B, Xia Z, Smith JA, Dawson MD, Englund D, Strain MJ.   +7 more
europepmc   +1 more source

Next-Gen Healthcare Devices: Evolution of MEMS and BioMEMS in the Era of the Internet of Bodies for Personalized Medicine. [PDF]

Micromachines (Basel)
Marinescu MR, Ionescu ON, Pachiu CI, Dinescu MA, Muller R, Șuchea MP.   +5 more
europepmc   +1 more source

Teach your microscope how to print: low-cost and rapid-iteration microfabrication for biology.

Lab Chip
Hinderling L, Hadorn R, Kwasny M, Frei J, Grädel B, Psalmon S, Blum Y, Berthoz R, Landolt AE, Towbin BD, Riveline D, Pertz O.   +11 more
europepmc   +1 more source

On-chip particle levitation and micromanipulation using bulk acoustic waves.

Lab Chip
Vuille-Dit-Bille E, Dubois MA, Hwang J, Bayat D, Overstolz T, Dolev A, Heub S, Weder G, Despont M, Sakar MS.   +9 more
europepmc   +1 more source

Microfabrication for Si wafers by FAB etching

Applied Surface Science, 1993
Abstract Fast atom beam (FAB) etching is useful for microfabrication of insulators or composite materials with metals and semiconductors because of the electric neutral property. The FAB source for a large diameter of (8 inch) FAB has been developed and the characteristics have been studied by spectroscopic and other methods.
Takashi Nishimura, Hiroaki Suzuki, T. Satake   +2 more
openalex   +2 more sources

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Plasma-Assisted Etching in Microfabrication

Annual Review of Materials Science, 1983
It has long been recognized that a molecular gas glow discharge is a prolific source of chemically active radicals. However, it was not until the last twenty years or so that glow discharges were used to provide active radicals for the etching of solid materials.
J W Coburn, H F Winters
openaire   +1 more source

Microfabrication of Glassy Carbon by Electrochemical Etching

Journal of The Electrochemical Society, 2004
Due to the broad impact of microfabrication technology on chemistry and biology, new methods to pattern and etch a variety of materials are being explored in a number of laboratories. We have developed a method for the etching of glassy carbon (GC) that opens pathways for the creation of new electrode patterns and devices.
Gregory K. Kiema, Solomon Ssenyange, Mark T. McDermott   +2 more
openaire   +1 more source