Results 241 to 250 of about 43,392 (299)

High-topological charge extreme-ultraviolet spatiotemporal vortices via high harmonic generation

Martin-Hernandez R, Gui G, Plaja L, Kapteyn H, Murnane M, Liao C, Porras M, Hernández-García C.   +7 more
europepmc   +1 more source

CMOS‐Integrated Synaptic Photoreceptor Chip Inspired by Insect Visual Processing

Advanced Science, EarlyView.
CMOS‐integrated Si QDs/ReS2 synaptic photoreceptor array mimics the parallel processing and wavelength‐selective strategy of insect vision. By combining intrinsic ultraviolet‐violet sensitivity with synaptic plasticity, the chip enables frontend sensory redundancy reduction without external filters, offering a scalable pathway toward lowpower ...
Jian Chai, Xinyi Xu, Yue Wang, Xiaochen Wang, Hailiang Wang, Yunfei Xie, Xinwei Zhang, Haoyu Wang, Hao Ning, Jiangming Lin, Yongliang Xie, Qihai Jiang, Baoshi Qiao, Xiaolei Ding, Luyao Ma, Shukai Duan, Zhenyi Ni, Huan Hu, Xin He, Fei Xue, Feichi Zhou, Lingfei Li, Srikrishna Chanakya Bodepudi, Rui Yuan, Bin Yu, Yang Xu   +25 more
wiley   +1 more source

Extreme Ultraviolet Spectroscopy

Journal of the Spectroscopical Society of Japan, 1960
openaire   +2 more sources

Laser techniques for extreme ultraviolet spectroscopy Boulder, 1982

, 1982
MacIlrath, Thomas J., Topical Meeting on Laser Techniques for Extreme Ultraviolet Spectroscopy 1982 Boulder, Colo.   +1 more
core  

Bionic Solar‐Powered Heavy Metal Trap for Eco‐Friendly Sludge Drying and Simultaneous Electricity Generation

Advanced Science, EarlyView.
Herein, we propose a solar‐powered heavy metal trap (SPHT) for sludge disposal. The indoor experiments demonstrated that the sludge water content decreased from 90 % to 31 %, coupled with a decrease in heavy metal content to 6 % at most. Furthermore, the designed SPHT generated an initial potential of 0.10 V, and monitoring this hydrovoltaic potential ...
Yanlin Li, Jinglan Wang, Hailin Gu, Zhen Yu, Fawei Lin, Cunku Dong, Ningning Cao, Miao Yu   +7 more
wiley   +1 more source

Temperature‐Driven Emission Redistribution of Yb2+ in SrB4O7 Enables Highly Sensitive Optical Thermometry Supported by Multiple Linear Regression

Advanced Science, EarlyView.
A novel optical thermometer exploits the rare UV emission of Yb2+ ions in a SrB4O7 host, enabling highly sensitive, non‐contact temperature measurements from 80 to 420 K. The applied multiple linear regression (MLR) analysis results in a multiple increase in the resulting temperature sensitivity.
Fang Zhao, Teng Zheng, Przemysław Woźny, Miguel A. Hernández‐Rodríguez, Shiqing Xu, Inocencio R. Martín, Marcin Runowski   +6 more
wiley   +1 more source

Unraveling the Power of Disorder: A Bioinspired Cuttlebone Structure With Superior Strength, Energy Absorption and Isotropy

Advanced Science, EarlyView.
Cuttlebone‐inspired architected metamaterials introduce controlled structural disorder to simultaneously enhance strength, energy absorption, and compressive stability. Tunable disorder suppresses shear anisotropy, outperforms periodic lattices, and establishes discrete randomness as a robust route to high‐performance lightweight mechanical ...
Zengqin Shi, Peng Jiang, Xiaoyan Zhu, Suyun Li, Wenqing Wang, Tian Zhao, Rujie He, Ying Li   +7 more
wiley   +1 more source

Deciphering the Dynamic Balance Between Solvation Strength and Polysulfides Reaction Heterogeneity in Practical Lithium‐Sulfur Batteries

Advanced Science, EarlyView.
A weakly solvating fluorinated cosolvent (1200ET) enables precise solvation‐power regulation in Li–S batteries, decoupling interfacial stabilization from sulfur redox kinetics. This approach suppresses polysulfide dissolution while preserving reaction kinetics, leading to a stable Li metal interface and high‐energy multilayer pouch cells, revealing a ...
Huidong Dai, Pranathi Garlapati, Srinidi Badhrinathan, Luisa Gomes, Tongtai Ji, Dominik Wierzbicki, Yonghua Du, Neville Pavri, Sanjeev Mukerjee, Gaind P. Pandey   +9 more
wiley   +1 more source

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Extreme ultraviolet lithography

Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1998
An extreme ultraviolet (EUV) lithography tool using 13.4 nm radiation is being developed by a consortium of integrated circuit (IC) manufacturers to support 100 nm imaging for integrated circuit production. The 4×, 0.1 NA alpha tool has a >1 μm depth of focus, all reflective optics, a xenon laser plasma source, and robust reflective masks.
David Attwood
exaly   +2 more sources

Extreme Ultraviolet Lithography

Optics and Photonics News, 1999
Sweeney and Stulen discuss an optical approach to microlithography used in high volume integrated circuit manufacturing, based on extreme UV radiation, and using a laser produced plasma source of radiation, a reflective mask, and a 4x reduction all-reflective imaging system.
R.H. Stulen, D.W. Sweeney
openaire   +1 more source