Results 251 to 260 of about 43,392 (299)

Characterization of extreme ultraviolet masks by extreme ultraviolet scatterometry

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2004
The applicability of scatterometry for mask critical dimension (CD) metrology at extreme ultraviolet (EUV) wavelengths is investigated. Two different mask absorber stacks, a Cr∕SiO2 mask and a TaN∕Cr mask are patterned with periodic lines and spaces pattern and measured at EUV wavelengths in the range of λ=13.35–13.57nm.
J. Perlich, F.-M. Kamm, J. Rau, F. Scholze, G. Ulm   +4 more
openaire   +1 more source

Extreme Ultraviolet Explorer spectrometer

Applied Optics, 1985
The design and calculated performance is described for a spectrometer included on the Extreme Ultraviolet Explorer (EUVE) astronomical satellite. The instrument is novel in design, consisting of three plane reflection gratings mounted in the converging beam behind a grazing incidence telescope. This configuration is based on new varied line-space (VLS)
M C, Hettrick, S, Bowyer, R F, Malina, C, Martin, S, Mrowka   +4 more
openaire   +2 more sources

Estimation of Extreme Ultraviolet Power and Throughput for Extreme Ultraviolet Lithography

Japanese Journal of Applied Physics, 2001
Extreme ultraviolet (EUV) power and wafer throughput were estimated based on a scanning imaging system. The EUV power on a mask was estimated from the number of reflective mirrors, their reflectivity, resist sensitivity, scanning speed and exposure time. Wafer throughput was estimated for one-way scanning exposure.
Akira Chiba, Kazuya Ota, Taro Ogawa, Shinji Okazaki   +3 more
openaire   +1 more source

Nonlinear optics in the extreme ultraviolet

Nature, 2004
Nonlinear responses to an optical field are universal in nature but have been difficult to observe in the extreme ultraviolet (XUV) and soft X-ray regions owing to a lack of coherent intense light sources. High harmonic generation is a well-known nonlinear optical phenomenon and is now drawing much attention in attosecond pulse generation.
Taro, Sekikawa, Atsushi, Kosuge, Teruto, Kanai, Shuntaro, Watanabe   +3 more
openaire   +2 more sources

A frequency comb in the extreme ultraviolet

Digest of the LEOS Summer Topical Meetings, 2005., 2005
Since 1998, the interaction of precision spectroscopy and ultrafast laser science has led to several notable accomplishments. Femtosecond laser optical frequency 'combs' (evenly spaced spectral lines) have revolutionized the measurement of optical frequencies and enabled optical atomic clocks.
Gohle, C., Udem, T., Herrmann, M., Rauschenberger, J., Holzwarth, R., Schuessler, H., Krausz, F., Hänsch, T.   +7 more
openaire   +4 more sources

Mirrors for the extreme ultraviolet

AIP Conference Proceedings, 1984
High reflectivity normal incidence mirrors do not exist for wavelength λ < 1100 Å. There are no absorption-free dielectrics available which can protect a mirror from oxidation or can be incorporated into a loss-free multilayer. Furthermore the reflectivity of all materials decreases with decreasing wavelength to values around 1% at λ = 200 Å for the
openaire   +1 more source

Extreme ultraviolet mask defect observation using an extreme ultraviolet microscope

SPIE Proceedings, 2013
To predict the effect of a phase defect position relative to the absorber pattern on a wafer printed image, a programmed phase defect mask was fabricated, and was observed using an extreme ultraviolet (EUV) microscope employing EUV light from a beam line BL3 of the New SUBARU at the University of Hyogo.
Tsuyoshi Amano, Tsuneo Terasawa, Hidehiro Watanabe, Mitsunori Toyoda, Tetsuo Harada, Takeo Watanabe, Hiroo Kinoshita   +6 more
openaire   +1 more source

Testing extreme ultraviolet optics with visible-light and extreme ultraviolet interferometry

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2002
Optics for extreme ultraviolet (EUV) lithography arguably have the most strict fabrication tolerances of any optical systems fabricated to date, and the development of EUV lithography pushes advanced optical fabrication techniques toward never before realized levels of figure accuracy and finish quality.
Kenneth A. Goldberg, Patrick Naulleau, Jeffrey Bokor, Henry N. Chapman, Anton Barty   +4 more
openaire   +1 more source

Frequency mixing in the extreme ultraviolet

Applied Optics, 1980
The generation of coherent XUV radiation through harmonic generation and frequency mixing is described. Results that have been obtained using third- to ninth-order nonlinear interactions are summarized. The use of rare gas halide lasers for generating tunable XUV radiation is discussed.
openaire   +2 more sources

A Double Monochromator for the Extreme Ultraviolet

Applied Optics, 1969
The optical design of a double monochromator suitable for use in the extreme uv is presented. The system employs fixed entrance and exit slits and two concave diffraction gratings which are rotated to vary the wavelength at the exit slit. Adjustment of the optical parameters and use of symmetry produces an approximate focusing condition accurate to ...
openaire   +2 more sources