Results 251 to 260 of about 108,927 (272)

Focused electron beam induced deposition of nickel

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2007
Focused electron beam induced depositions of nickel-containing materials obtained by using bis(methylcyclopentadienyl)nickel(II) Ni(C5H4CH3)2 and tetrakis(trifluorophosphine)nickel(0) Ni(PF3)4 as precursors, were compared in terms of chemical composition and electrical resistivity. Ni(PF3)4 decomposed into higher Ni content materials than that obtained
A. Perentes, G. Sinicco, G. Boero, B. Dwir, P. Hoffmann   +4 more
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Fundamental Proximity Effects in Focused Electron Beam Induced Deposition

ACS Nano, 2011
Fundamental proximity effects for electron beam induced deposition processes on nonflat surfaces were studied experimentally and via simulation. Two specific effects were elucidated and exploited to considerably increase the volumetric growth rate of this nanoscale direct write method: (1) increasing the scanning electron pitch to the scale of the ...
Harald, Plank, Daryl A, Smith, Thomas, Haber, Philip D, Rack, Ferdinand, Hofer   +4 more
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Focused Electron Beam Induced Deposition of Gold and Rhodium

MRS Proceedings, 2000
ABSTRACTElectron beam induced deposition with two noble metal precursors (Rhodium and Gold) having the same halogeno and trifluorophosphine ligands is presented. The deposit geometry of lines and freestanding bridges is discussed with respect to electron energy, beam shape, and backscattered electron distribution.
P. Hoffmann, I. Utke, F. Cicoira, B. Dwir, K. Leifer, E. Kapon, P. Doppelt   +6 more
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Focused, Nanoscale Electron-Beam-Induced Deposition and Etching

Critical Reviews in Solid State and Materials Sciences, 2006
Focused electron-beam-induced (FEB-induced) deposition and etching are versatile, direct-write nanofabrication schemes that allow for selective deposition or removal of a variety of materials. Fundamentally, these processes are governed by an electron-induced reaction with a precursor vapor, which may either result in decomposition to a solid deposit ...
S. J. Randolph, J. D. Fowlkes, P. D. Rack   +2 more
openaire   +1 more source

Focused electron beam-induced deposition at cryogenic temperatures

Journal of Materials Research, 2011
Abstract
M. Bresin, B.L. Thiel, M. Toth, K.A. Dunn   +3 more
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Focused electron beam induced deposition as a tool to create electron vortices

Micron, 2016
Focused electron beam induced deposition (FEBID) is a microscopic technique that allows geometrically controlled material deposition with very high spatial resolution. This technique was used to create a spiral aperture capable of generating electron vortex beams in a transmission electron microscope (TEM). The vortex was then fully characterized using
A. Béché, R. Winkler, H. Plank, F. Hofer, J. Verbeeck   +4 more
openaire   +3 more sources

Technology basis and perspectives on focused electron beam induced deposition and focused ion beam induced deposition

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2014
Abstract The main characteristics of focused electron beam induced deposition (FEBID) and focused ion beam induced deposition (FIBID) are presented. FEBID and FIBID are two nanopatterning techniques that allow the fabrication of submicron patterns with nanometer resolution on selected locations of any kind of substrate, even on highly structured ...
openaire   +1 more source

Periodic structure formation by focused electron-beam-induced deposition

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2004
Focused electron-beam-induced deposition from a copper precursor is shown to allow self-formation of periodic features when the beam is scanned at lateral speeds of the order of the vertical deposition rate. The period of the structures can be tuned by the scan speed.
T. Bret, I. Utke, C. Gaillard, P. Hoffmann   +3 more
openaire   +1 more source

Fabrication of nanofigures by focused electron beam-induced deposition

Thin Solid Films, 2004
Contamination lithography has been performed on various metal substrates by focused electron beam-induced deposition (EBID) technique in a field emission scanning electron microscope (FE-SEM). We used pump oil (hydrocarbon) as precursors for EBID. It was found that the growth rate was independent of primary electron energy (500 to 30 keV) but was ...
Kazuyuki Ueda, Masamichi Yoshimura
openaire   +1 more source

Binary Pt–Si Nanostructures Prepared by Focused Electron-Beam-Induced Deposition

ACS Nano, 2011
Binary systems of Pt-Si are prepared by electron-beam-induced deposition using the two precursors, trimethyl(methylcyclopentadienyl)platinum(IV) (MeCpPt(Me)(3)) and neopentasilane (Si(SiH(3))(4)), simultaneously. By varying the relative flux of the two precursors during deposition, we are able to study composites containing platinum and silicon in ...
Marcel, Winhold, Christian H, Schwalb, Fabrizio, Porrati, Roland, Sachser, Achilleas S, Frangakis, Britta, Kämpken, Andreas, Terfort, Norbert, Auner, Michael, Huth   +8 more
openaire   +2 more sources