Results 191 to 200 of about 18,197 (240)

Enhanced Secondary-Electron Detection of Single-Ion Implants in Silicon through Thin SiO₂ Layers. [PDF]

Nano Lett
Schneider EB, Lloyd-Willard OG, Stockbridge K, Ludlow M, Eserin S, Antwis L, Cox DC, Webb RP, Murdin BN, Clowes SK.   +9 more
europepmc   +1 more source

Integrated Strategies for Overcoming Resolution Limits in Electron Beam Lithography of Chemically Amplified Resists. [PDF]

ACS Appl Mater Interfaces
Wu X, Tiwale N, Stein A, Nam CY.
europepmc   +1 more source

Dual-Functional 3D-Nanoprinted AFM Probes for Correlative Magnetic and Conductive Characterization. [PDF]

Small Methods
Seewald LM, Winkler R, Kothleitner G, Plank H.   +3 more
europepmc   +1 more source

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Focused electron beam induced deposition of gold

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2000
Codeposition of hydrocarbons is a severe problem during focused electron beam writing of pure metal nanostructures. When using organometallic precursors, a low metal content carbonaceous matrix embedding and separating numerous nanosized metal clusters is formed. In this work, we present a new and easy approach to obtain high purity gold lines: the use
I. Utke, P. Hoffmann, B. Dwir, K. Leifer, E. Kapon, P. Doppelt   +5 more
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Ultralow-energy focused electron beam induced deposition

Applied Physics Letters, 1994
We have studied focused electron beam induced deposition from W(CO)6 at beam primary energies between 20 and 0.06 keV. Submicrometer resolution with 4 nA beam current was maintained at very low primary energies using a retarding field configuration. Decomposition cross sections of W(CO)6 for primary energies below about 1 keV were found to be about a ...
P. C. Hoyle, J. R. A. Cleaver, H. Ahmed
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Focused electron beam induced deposition of nickel

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2007
Focused electron beam induced depositions of nickel-containing materials obtained by using bis(methylcyclopentadienyl)nickel(II) Ni(C5H4CH3)2 and tetrakis(trifluorophosphine)nickel(0) Ni(PF3)4 as precursors, were compared in terms of chemical composition and electrical resistivity. Ni(PF3)4 decomposed into higher Ni content materials than that obtained
A. Perentes, G. Sinicco, G. Boero, B. Dwir, P. Hoffmann   +4 more
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Fundamental Proximity Effects in Focused Electron Beam Induced Deposition

ACS Nano, 2011
Fundamental proximity effects for electron beam induced deposition processes on nonflat surfaces were studied experimentally and via simulation. Two specific effects were elucidated and exploited to considerably increase the volumetric growth rate of this nanoscale direct write method: (1) increasing the scanning electron pitch to the scale of the ...
Harald, Plank, Daryl A, Smith, Thomas, Haber, Philip D, Rack, Ferdinand, Hofer   +4 more
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Focused Electron Beam Induced Deposition of Gold and Rhodium

MRS Proceedings, 2000
ABSTRACTElectron beam induced deposition with two noble metal precursors (Rhodium and Gold) having the same halogeno and trifluorophosphine ligands is presented. The deposit geometry of lines and freestanding bridges is discussed with respect to electron energy, beam shape, and backscattered electron distribution.
P. Hoffmann, I. Utke, F. Cicoira, B. Dwir, K. Leifer, E. Kapon, P. Doppelt   +6 more
openaire   +2 more sources