Results 211 to 220 of about 3,083 (223)

Super-Lamination HZO/ZrO₂/HZO of Ferroelectric Memcapacitors With Morphotropic Phase Boundary (MPB) for High Capacitive Ratio and Non-Destructive Readout

IEEE Electron Device Letters
Z.-F. Lou, B.-R. Chen, K.-Y. Hsiang, Y.-T. Chang, C.-H. Liu, H.-C. Tseng, H.-T. Liao, P. Su, M. H. Lee   +8 more
openaire   +1 more source

Herpes Zoster Ophthalmicus (HZO, Herpetic Dendritis)

2019
openaire   +1 more source

Temperature-driven co-optimization of IGZO/HZO ferroelectric field-effect transistors for optoelectronic neuromorphic computing

Nano Energy
Deokjoon Eom, Changyu Park, Jinsung Park   +2 more
exaly  

Acid and organic resistant nano-hydrated zirconium oxide (HZO)/polystyrene hybrid adsorbent for arsenic removal from water

Chemical Engineering Journal, 2014
Bingcai Pan, Yanyang Zhang, Haojie Dong   +2 more
exaly  

Understanding HZO Thickness Scaling in Si FeFETs: Low Operating Voltage, Fast Wake-Up, and Suppressed Charge Trapping

IEEE Transactions on Electron Devices
Zuocheng Cai, Kasidit Toprasertpong, Zhenhong Liu   +2 more
exaly  

Ferroelectric tunnel junctions with 5 nm-thick HZO for tunable synaptic plasticity and neuromorphic computing

Journal of Alloys and Compounds
Sungjun Kim
exaly  

Tailoring Ferroelectric Performance and Domain Structure Ordering in HZO Capacitors via 2D-WS2 Multifunctional Layer

IEEE Transactions on Electron Devices
Hojung Jang, Kyumin Lee, Laeyong Jung
exaly  

Impacts of Grain-to-Grain Variability on Ferroelectric Polarization Switching in HZO

Extended Abstracts of the 2025 International Conference on Solid State Devices and Materials
Gui-Huai Chen, Pin Su
openaire   +1 more source

Ultra-low-voltage operation, large ferroelectric polarization, fast switching speed, and high endurance of 450 °C processed HZO thin films by starting-layer engineering

Journal of Materials Science and Technology
Qijun Yang, Binjian Zeng
exaly  

Modulating oxygen vacancies via sputtered WOx top electrodes for enhanced ferroelectricity and improved fatigue stability in HZO thin films

Ceramics International
Huiting Sui
exaly