Results 241 to 250 of about 80,951 (262)
Some of the next articles are maybe not open access.
Power deposition in high‐density inductively coupled plasma tools for semiconductor processing
Physics of Plasmas, 1995Jaeger E F, Batchelor D B
exaly
Matrix effects in inductively coupled plasma mass spectrometry: A review
Analytica Chimica Acta, 2011Christian Agatemor, Diane Beauchemin
exaly
Inductively Coupled Plasma Spectrometry
2003Stephen Hill, Mark Cave, Andrew Fisher
openaire +1 more source
Two‐dimensional hybrid model of inductively coupled plasma sources for etching
Applied Physics Letters, 1993Mark Kushner +2 more
exaly
INDUCTIVELY COUPLED PLASMA SOURCE FOR PLASMA PROCESSING
2012NAGORNY VLADIMIR +2 more
openaire +2 more sources

