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Inductively Coupled Plasmas (ICPs)

2003
Inductively Coupled Plasmas are so called because the RF electric field is induced in the plasma by an external antenna. ICPs have two main advantages: 1) no internal electrodes are needed as in capacitively coupled systems, and 2) no dc magnetic field is required as in ECR reactors.
Francis F. Chen, Jane P. Chang
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On nonlocal heating in inductively coupled plasmas

Plasma Sources Science and Technology, 2002
A simple analytic model describing nonlocal (anomalous) electron heating in inductively coupled plasmas (ICPs) is developed. The model takes into account both collisionless (nonlocal) and collisional effects, and is thus valid for all collisionality regimes.
Tyshetskiy Yu.O.   +2 more
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Analyte ionization in the inductively coupled plasma

Spectrochimica Acta Part B: Atomic Spectroscopy, 1985
Abstract Spatially resolved ion-atom emission intensity ratios for Sr, Ca, Mg, Cd and Zn have been measured at rf power settings of 1.00, 1.25, 1.50, 1.75 and 2.0 kW at a vertical height of 16 mm above the load coil. Measured values of electron density have been used to construct a theoretical local thermal equilibrium (LTE) framework, and ion-atom ...
B.L. Caughlin, M.W. Blades
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Review of inductively coupled plasmas for plasma processing

Plasma Sources Science and Technology, 1992
The need for large-area, high-density plasma sources for plasma-aided manufacturing of integrated circuits has created a renewed interest in inductively coupled plasmas (ICPs). Several ICP reactor geometries are briefly reviewed. Typically, inductive coupling of RF power (0.5-28 MHz) can produce ion densities in excess of 1012 cm-3 even at submillitorr
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Inductively coupled plasmas

Analytical Chemistry, 1974
Velmer A. Fassel, Richard N. Kniseley
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Stabilization of an inductively coupled plasma for inductively coupled plasma mass spectrometry with a flared torch extension

Journal of Analytical Atomic Spectrometry, 1992
An audio-frequency peak in noise power spectra of signals from emission and mass spectrometers, which use an inductively coupled plasma (ICP) as a source, has been associated by a number of workers with instability at the boundary of the plasma plume where it enters the surrounding atmosphere at the mouth of the torch.
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Induction-Coupled Plasma Torch

Journal of Applied Physics, 1961
A new method of generating a stable plasma at atmospheric pressure using inductive coupling at a frequency of several Mc is described. Methods of starting and operating this plasma in argon, and mixtures of argon with helium, hydrogen, oxygen, and air are discussed.
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Inductively coupled plasma—atomic emission spectrometry

1987
Optical emission spectrometry is a well proven analytical technique, in widespread use for the last 30 to 40 years. However, early devices available as optical emission sources (arc, spark or dc electrical discharges) had a number of disadvantages that prevented their widespread use for fully quantitative analysis of silicate samples.
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