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Atomistic Simulation of the Ion-Assisted Deposition of Silicon Dioxide Thin Films [PDF]

open access: yesNanomaterials, 2022
A systematic study of the most significant parameters of the ion-assisted deposited silicon dioxide films is carried out using the classical molecular dynamics method.
F. V. Grigoriev   +2 more
doaj   +4 more sources

Effect of Ion Beam Assisted Deposition technology on the cathode of solar cells [PDF]

open access: yesMATEC Web of Conferences, 2019
We realized organic solar cells on ITO anode based on small – molecular materials (CUPC:C60) to be easy to fabricate, cost price, production on large surfaces, efficiency, flexibility and large market of solar panels, but the organic materials are ...
Chakaroun M., Saleh A., El-Khatib M.
doaj   +1 more source

Optimization of Electron-Beam Evaporation Process Parameters for ZrN Thin Films by Plasma Treatment and Taguchi Method

open access: yesPlasma, 2023
This study presents the optimal process parameters of zirconium nitride (ZrN) thin films prepared by ion-assisted deposition (IAD) technology combined with electron-beam evaporation based on plasma surface treatment and the Taguchi method. We use Minitab
Chuen-Lin Tien   +2 more
doaj   +1 more source

Mechanical Properties of 3D Nanostructures Obtained by Focused Electron/Ion Beam-Induced Deposition: A Review

open access: yesMicromachines, 2020
This article reviews the state-of-the -art of mechanical material properties and measurement methods of nanostructures obtained by two nanoscale additive manufacturing methods: gas-assisted focused electron and focused ion beam-induced deposition using ...
Ivo Utke   +3 more
doaj   +1 more source

Effects of KH-570 Silane Electrochemical-assisted Deposition on Corrosion Resistance of AZ31B Magnesium Alloy

open access: yesJournal of Aeronautical Materials, 2016
Electrochemical-assisted deposition was used to treat AZ31B magnesium alloy with silanes. The effects of additive amounts of γ-(methacryloxy) propyltrimethoxysilane (KH-570) on quality and corrosion resistance of the formed films were studied by the ...
JIN Jing   +6 more
doaj   +1 more source

Amorphous-crystalline boron-containing coatings formed by the ion-plasma

open access: yesФизико-химические аспекты изучения кластеров, наноструктур и наноматериалов, 2023
Using the method of high-frequency ion-plasma sputtering (magnetron high-frequency deposition under conditions of ion-plasma assisted using a gas (argon) plasma generator «PINK») on the surface of a high-entropy CoFeCrMnNi alloy of non-equiatomic ...
Yu.F. Ivanov   +6 more
doaj   +1 more source

Effect of Low Temperature Nitriding of 100Cr6 Substrates on TiN Coatings Deposited by IBAD [PDF]

open access: yesMaterials Research, 2015
In this paper we studied the influence of pre-treating the surface of 100Cr6 steel by ion beam nitriding at low temperature (380°C) on the surface topography and wear resistance of thin TiN coatings deposited by reactive ion beam assisted deposition. The
Sandra dos Santos Vales   +6 more
doaj   +2 more sources

Integration of an Aerosol-Assisted Deposition Technique for the Deposition of Functional Biomaterials Applied to the Fabrication of Miniaturised Ion Sensors

open access: yesNanomaterials, 2021
Ion-selective electrodes are at the forefront of research nowadays, with applications in healthcare, agriculture and water quality analysis among others. Despite multiple attempts of miniaturization of these polyvinyl chloride (PVC) gel-based ion sensors,
Antonio Ruiz-Gonzalez, Kwang-Leong Choy
doaj   +1 more source

Ion-assisted deposition of mixed TiO2-SiO2 films [PDF]

open access: yesJournal of Applied Physics, 1989
Mixed thin films of TiO2 and SiO2 were produced by coevaporation from separate electron-beam sources and simultaneous bombardment of the growing film with oxygen ions. The optical properties of the films were determined during growth by in situ ellipsometry and the surface composition of the deposited films studied by in situ ion scattering ...
Netterfield, R. P.   +5 more
openaire   +3 more sources

Microstructure of zi rcon is films deposited with ion assistance

open access: yesJournal of Materials Science, 1987
Zirconia films were deposited in vacuum from an electron-beam hearth with simultaneous ion bombardment from a Kaufman source. The effects of argon, oxygen and nitrogen ions were investigated, together with those of temperature and substrate type. For amorphous substrates, without ions, X-ray and electron diffraction showed that amorphous films were ...
Mckenzie, D   +5 more
openaire   +1 more source

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