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Selective cobalt and nickel separation by bioacid-mediated electrowinning. [PDF]
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Ion-Assisted Deposition Of Fluorides
SPIE Proceedings, 1986Ion-assisted deposition (IAD) has been used to deposit magnesium fluoride, cryolite (Na3A1F6), and lanthanum fluoride films on ambient temperature substrates. IAD magnesium fluoride coatings show increased density and moisture resistance, while IAD lanthanum fluoride coatings exhibit increased refractive indices.
J D. Targove +7 more
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Low-temperature growth and ion-assisted deposition
Physical Review B, 1995Using standard molecular-dynamics methods, we have simulated silicon molecular-beam epitaxy on a (100) substrate, subject to a second beam of low-energy argon atoms. We find that the presence of the ion beam has an important effect on the structure of the deposits formed: good crystalline material forms at significantly lower temperatures, where ...
, Strickland, , Roland
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Optical coatings deposited using ion assisted deposition
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1987The properties of Ta2O5 and Al2O3 optical coatings deposited using oxygen-ion assisted deposition (IAD) were investigated. Previously,1 we reported preliminary results for Ta2O5 and Al2O3 coatings deposited using IAD. In this paper, we present results illustrating the effects of oxygen-ion bombardment on film optical constants, environmental durability,
James J. McNally +3 more
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Ion-assisted deposition of optical coatings
SPIE Proceedings, 1996ABSTRACT Ion assisted deposition technique (lAD) and effects of this technique on properties of optical coatingsare investigated inthis paper.We have produced thin-film samples by bombarding with different ions such asoxygen,argon and mixture of thetwo during deposition,of which the refractive index,the extinctive coefficient and the laser induced ...
Zhengxiu Fan, Rui-Ying Fan, Xuefei Tang
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Ion-assisted pulsed-laser deposition
Review of Scientific Instruments, 1995Ion bombardment on the surface of a substrate during deposition of a thin film [ion-assisted (IA) deposition] is used to control thin-film crystalline orientation and phase. Ion-assisted deposition is demonstrated with the relatively new pulsed-laser deposition (PLD) technique, a method of thin-film growth that has shown promise for the synthesis of ...
R. P. Reade, S. R. Church, R. E. Russo
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The role of ion-assisted deposition in PVD
SPIE Proceedings, 2008An optimal energy interval in ion-assisted deposition of high crystalline films is predicted in the modeling of ion impacting on surface. The result is in good agreement with the presented experiments. The possible application of the evaluation of ion role for the fabrication of potential thin film materials is expected.
Z. Q. Ma +5 more
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Optical properties of ThF_4 films deposited using ion-assisted deposition
Applied Optics, 1987Ion beam processes have been employed in different deposition techniques for the purpose of improving the optical and mechanical properties of thin films. One technique is ion-assisted deposition (IAD) which involves the bombardment of the growing film with low energy ions.
G A, Al-Jumaily +3 more
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Temperature-stable bandpass filters deposited with plasma ion-assisted deposition
Applied Optics, 1996Plasma ion-assisted deposition with an advanced plasma source was investigated to produce narrow-bandpass filters in the near-infrared spectral range for telecommunication applications. The multilayer coatings were qualified by the optical performance, the vacuum-to-air behavior, the temperature stability, and the film stress. TiO(2)/SiO(2) and Ta(2) O(
A, Zöller +3 more
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