Results 211 to 220 of about 32,865 (266)

Ion-assisted deposition of lanthanum fluoride thin films

Applied Optics, 1987
Ion-assisted deposition has been used to deposit lanthanum fluoride thin films with near-unity film packing densities and no significant increase in absorption. Rutherford backscattering analysis has determined the effect of ion bombardment on the film stoichiometries including the degree of fluorine deficiency.
J D, Targove, J P, Lehan, L J, Lingg, H A, Macleod, J A, Leavitt, L C, McIntyre   +5 more
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Ion–assisted sputter deposition

Philosophical Transactions of the Royal Society of London. Series A: Mathematical, Physical and Engineering Sciences, 2003
A review of the development of the ion-assisted sputter-deposition process is given. The special features of thin films produced by this technique are outlined and some main applications and future developments are discussed.
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Properties of dielectric coatings produced by ion assisted deposition

Applied Optics, 1989
Some metal oxides, fluorides, and ZnS films deposited by ion assisted deposition are investigated as a function of ion energy, ion variety, and ion source type. Both optical and mechanical properties, such as optical stability, absorption and scattering losses, laser damage threshold, and durability, are examined for samples deposited with the ...
P F, Gu, Y M, Chen, X Q, Hu, J F, Tang
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Protective dielectric coatings produced by ion-assisted deposition

Applied Optics, 1984
Optically transparent dielectric films, when prepared by thermal evaporation or sputtering, have had limited use for many applications due to their permeability and lack of stability. We report on protective dielectric films produced by ion-beam-assisted deposition which demonstrate significant improvements over films produced by conventional ...
W G, Sainty, R P, Netterfield, P J, Martin   +2 more
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Optical properties of some ion assisted deposited oxides

Vacuum, 1991
were deposited with starting materials Zr02, Yb2O3, Gd203, Er203 and Ta2O5 both on mineral(BK7 glass) and on plastic (CR39) substrates in the same cycle for each set of depositionparameters. The refractive indexes of Zr02, Yb203, Gd203, Er203 were measured as functionof ion energy and current; the refractive index of Ta2O5 was measured also as a ...
F. Andreani, S. Luridiana, Shuzheng Mao
openaire   +1 more source

Ion-assisted sputter deposition of molybdenum-silicon multilayers

Applied Optics, 1993
X-ray multilayer (ML) structures that are fabricated by the use of magnetron-sputter deposition exhibit a degradation in structural quality as the deposition pressure is increased. The observed change in morphology is attributed to a reduced mobility of surface adsorbed atoms, which inhibits the formation of smooth, continuous layers.
S P, Vernon, D G, Stearns, R S, Rosen
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Ion-Assisted Deposition of Thermally Evaporated Ag Films

Optical Interference Coatings, 1987
Correlation of film properties and microstructure with ion beam parameters in ion-assisted deposition (IAD) provides insights for improving IAD thin films. It is well-known that the ion beam energy and ion flux are two main parameters which alter the microstructure of thin films and their optical properties.
C. K. Hwangbo, L. J. Lingg, J. P. Lehan, J. D. Targove, Michael R. Jacobson, H. Angus Macleod, J. L. Makous   +6 more
openaire   +1 more source

Enhanced gold film bonding by ion-assisted deposition

Applied Optics, 1984
Depot de couches d'or sur des supports en verre polis par evaporation par faisceau d'electrons assistee par faisceau d'ions et examen de l'adherence de ces ...
P J, Martin, W G, Sainty, R P, Netterfield   +2 more
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Deposition and modification of titanium nitride by ion assisted arc deposition

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1995
TiN films were deposited at ambient temperature onto silicon and sapphire substrates using a filtered Ti cathodic arc source and concurrent bombardment from a low energy nitrogen ion beam. The energy and flux of the nitrogen ions were varied and the influence on stress, microhardness, preferred orientation, and surface roughness of the deposited films ...
A. Bendavid, P. J. Martin, X. Wang, M. Wittling, T. J. Kinder   +4 more
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Ion assisted deposition of titanium chromium nitride

Thin Solid Films, 2006
Chromium titanium nitride films with different content of Cr and Ti were deposited on a silicon substrate by ion beam assisted deposition and characterised by Rutherford Backscattering Spectroscopy, X-ray Diffraction, X-ray Photoelectron Spectroscopy (XPS), Cross-sectional Transmission Electron Microscopy and nanoindentation testing. All of the samples
V.M. Vishnyakov, V.I. Bachurin, K.F. Minnebaev, R. Valizadeh, D.G. Teer, J.S. Colligon, V.V. Vishnyakov, V.E. Yurasova   +7 more
openaire   +3 more sources