Results 231 to 240 of about 32,865 (266)

Ion assisted deposition of thin layers

2007
Ion beam assisted deposition, the bombardment of thin films with a beam of energetic particles has become a highly developed tool for the preparation of thin films. This technique provides thin films and coatings with modified microstructure and properties. In this paper three examples are presented for the modifying the structure: in-situ modification
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ION-ASSISTED REACTIVE DEPOSITION PROCESSES FOR OPTICAL COATINGS

Surface and Coatings Technology, 1990
Abstract Thin films generally have properties which are different from those of the bulk starting material. Regarding optical properties, the observed values of the refractive indices and absorption coefficients are often lower or higher than the optical constants of the same bulk material.
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UHV-STM study on ion-assisted deposition

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 2000
Abstract Ion-assisted deposition is widely used for ultra high quality films. It is necessary to understand the role of ion bombardment during film formation. The apparatus which combines the Variable Temperature Scanning Tunneling Microscope (VT-STM) and an ion source in ultra high Vacuum (UHV) have been constructed.
Toshio Seki, Jiro Matsuo, Isao Yamada
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Intermittent Ion Assisted Deposition of Silica and Titania

Optical Interference Coatings, 1988
The improvement of the optical and mechanical properties of optical thin films towards more bulk like behaviour achieved by ion assisted deposition is well established1-5. In principle it should be possible to mount a ion gun in a conventional evaporation chamber in order to take advantage of the IAD process. But there are some questions to be answered
M. Kaspar, R. Pfefferkorn
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Ion assisted selective thin film deposition

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1986
Ion bombardment of a growing film is one known way of changing film properties. Also in reactive etching, ions may assist surface reactions. We will present a study where different substrates are bombarded by energetic argon ions during deposition of titanium. If titanium is deposited onto three different substrates without influencing the substrate by
S. Berg, C. Nender, B. Gelin, M. Östling   +3 more
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MOLECULAR DYNAMICS SIMULATION OF ION ASSISTED DEPOSITION

Surface Engineering, 1994
Ion plasma deposition with simultaneous ion bombardment is one of the most promising techniques to improve the structure and properties of coatings. These effects are strongly dependent on the ion irradiation characteristics (current density, energy, etc.).
A. V. Byeli, S. A. Fedotov
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Ion-assisted thin film deposition and applications

Vacuum, 1986
Abstract Some general aspects of ion-surface interactions and their relation to ion-assisted deposition (IAD) are discussed. Applications of IAD are reviewed with emphasis on the improvement of the optical properties of dielectric films. IAD is seen to be a useful technique for increasing refractive indices and stabilizing the optical properties of ...
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Ion-assisted deposition of Al2O3 thin films

Annual Meeting Optical Society of America, 1987
Aluminum oxide films have been deposited by ion-assisted deposition. The films were electron beam evaporated at a chamber temperature of 100°C with argon and/or oxygen ion bombardment. The optical constants of these films have been measured in the visible and UV: the refractive index of the films has been increased by the bombardment (to 1.70 at 350 nm)
J. D. Targove, M. J. Messerly, H. A. Macleod   +2 more
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Review of ion-assisted deposition: Research to production

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
Abstract Evaporated thin films generally have many defects, and properties inferior to bulk materials. Low-energy ion bombardment during deposition provides surface cleaning, improved nucleation and growth, and in situ annealing. Mechanisms, equipment, procedures, and applications are described for ion-assisted deposition (IAD) and ion-beam cleaning (
L.A. Stelmack, C.T. Thurman, G.R. Thompson   +2 more
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ION-ASSISTED DEPOSITION OF OPTICAL THIN FILMS

Materials and Manufacturing Processes, 1991
Some useful materials, such as ZnS, MgF2, ZrO2, Ta2O5, HfO2, and SiO2, deposited using ion assisted deposition (IAD) are investigated as a function of ion energy and ion source type. Both optical and mechanical properties such as optical stability, absorption and scattering losses, laser damage threshold, and durability are examined.
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