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Oxygen-ion-assisted deposition of TiO films

Vacuum, 2000
Abstract Layers of crystalline FCC-TiO, possessing low electrical resistivity combined with a high antidiffusion efficiency are considered as promising thin films materials for applications in microelectronic layered structures. Low temperature growth of titanium monoxide thin films was performed by oxygen-ion-assisted physical vapour deposition. The
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Modelling ion-assisted deposition of CeO2 films

Applied Physics A Solids and Surfaces, 1986
The theory presented explains quantitatively the experimentally observed increase in film density of a vapor-deposited CeO2 film when bombarded during growth with low-energy O 2 + ions. The density enhancement is expressed in terms of the yields for recoil implantation of surface atoms, ion ...
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Ion-Assisted Magnetron Deposition of AlN Films

Russian Microelectronics, 2023
R. V. Selyukov, V. V. Naumov
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Properties of the YbF3 Films Prepared by Ion-Assisted Deposition

Coatings, 2022
Yiqin Ji, Huasong Liu, Jiahuan He
exaly  

Mechanism of texture development in ion-beam-assisted deposition

Applied Physics Letters, 1999
David J Srolovitz, Srolovitz D J
exaly  

An evaporation source for ion beam assisted deposition in ultrahigh vacuum

Review of Scientific Instruments, 2002
Juergen Kirschner, Kirschner J
exaly  

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