Results 241 to 250 of about 154,212 (298)
Some of the next articles are maybe not open access.
2023
This chapter discusses the ion implantation process of silicon processing technology in depth. The chapter gives an in-depth insight into various aspects of the ion implantation process and ion-implanted silicon systems commonly encountered in a silicon process.
Sunipa Roy +3 more
openaire +1 more source
This chapter discusses the ion implantation process of silicon processing technology in depth. The chapter gives an in-depth insight into various aspects of the ion implantation process and ion-implanted silicon systems commonly encountered in a silicon process.
Sunipa Roy +3 more
openaire +1 more source
Ion implantation in fullerenes
Fuel and Energy Abstracts, 1996Ion implantation of C60 fullerite induces large modifications such as amorphization, polymerization, and doping depending on the implant conditions.
J. Kastner, L. Palmetshofer
openaire +1 more source
Transport of ions during ion implantation
Physical Review E, 1996An efficient scheme for the description of long-mean-free-path particle transport at a kinetic level has been extended to a case where particle distributions are highly anisotropic: implantation of ions into a solid. The method calculates the scattering rate of particles throughout a region and obtains the particle distribution from the scattering rate.
, Parker, , Hitchon, , Keiter
openaire +2 more sources
Ion Implantation of Polythiophene
1987Polythiophene as a free-standing film has been ion implanted with F+-ions having 25 keV energy. A rapid conductivity increase starts at doses between 5·1015…5 .1016 F+/cm2. The conductivity changes by 6 orders of magnitude being 1.10−2 Ω−crn−1 at a highest dose of 1·1017 F+/cm2. RBS spectra show that a 0.35...0.40 μm surface layer is damaged.
Isotalo Heikki +2 more
openaire +2 more sources
Ion implantation in superconductors
Radiation Effects, 1975The possibility to introduce controlled amounts of impurities into material with the additional advantage to overcome restrictions due to solubility and diffusibility offers an attractive research tool to study near surface properties of material in a systematic manner.
openaire +1 more source
Ion implantation technology and ion sources
Review of Scientific Instruments, 2014Ion implantation (I/I) technology has been developed with a great economic success of industries of VLSI (Very Large-Scale Integrated circuit) devices. Due to its large flexibility and good controllability, the I/I technology has been assuming various challenging requirements of VLSI evolutions, especially in advanced evolutional characteristics of ...
openaire +2 more sources
Ion implantation and catalysis: Electrochemical applications of ion implantation
Nuclear Instruments and Methods, 1981Abstract Electrochemical processes at solid-liquid interfaces and catalytic reactions at solid-gas interfaces are typical examples of surface reactions. Any changes in structure and composition of the solid surface should affect the rate and mechanism of these reactions.
openaire +1 more source
Ion Implantation for Biomaterials
Materials Science Forum, 1992Y. Corre, J. Rieu, L.M. Rabbe, A. Pichat
openaire +1 more source
1994
Abstract Ion implantation involves the bombardment of a solid material with medium-to-high-energy ionized atoms and offers the ability to alloy virtually any elemental species into the near-surface region of any substrate. This article describes the fundamentals of the ion implantation process and discusses the advantages, limitations ...
James K. Hirvonen, Bruce D. Sartwell
openaire +1 more source
Abstract Ion implantation involves the bombardment of a solid material with medium-to-high-energy ionized atoms and offers the ability to alloy virtually any elemental species into the near-surface region of any substrate. This article describes the fundamentals of the ion implantation process and discusses the advantages, limitations ...
James K. Hirvonen, Bruce D. Sartwell
openaire +1 more source