Results 241 to 250 of about 1,383,826 (295)

Atmospheric pressure ion sources

Mass Spectrometry Reviews, 2009
AbstractThis review of atmospheric pressure ion sources discusses major developments that have occurred since 1991. Advances in the instrumentation and understanding of the key physical principles are the primary focus. Developments with electrospray and atmospheric pressure chemical ionization and variations encompassing adaptations for surface ...
Thomas R, Covey, Bruce A, Thomson, Bradley B, Schneider   +2 more
openaire   +2 more sources

A POSITIVE ION SOURCE

Canadian Journal of Research, 1948
Positive ions are formed in a low pressure electrodeless discharge which is excited by the radio-frequency field of a coil coupled to a 15 Mc. per sec. oscillator. The ions are extracted from the discharge through a pumping canal (2 mm. in diameter × 12 mm. in length) by a simple arrangement of electrodes. After further focusing and acceleration to 50 
A J, BAYLY, A G, WARD
openaire   +2 more sources

Gas discharge ion source III. Modified Berkeley multifilament ion source

Review of Scientific Instruments, 1978
Total ion current, ion energy, mass and current density distributions, and the impurity content of the ion beams produced by a modified Berkeley multifilament ion source (MFIS) were measured as a function of source configuration, gas pressure, and operating conditions: the ’’best’’ configuration produced beams of 200 mA or more at pressures between 0 ...
R W, Bickes, F M, Bacon, J B, O'Hagan
openaire   +2 more sources

Pantechnik new superconducting ion source: PantechniK Indian Superconducting Ion Source

Review of Scientific Instruments, 2012
The new ECR ion source PantechniK Indian Superconducting Ion Source (PKISIS) was recently commissioned at Pantechnik. Three superconducting coils generate the axial magnetic field configuration, while the radial magnetic field is done with the multi-layer permanent magnets.
G, Gaubert, C, Bieth, W, Bougy, N, Brionne, X, Donzel, R, Leroy, A, Sineau, C, Vallerand, A C C, Villari, T, Thuillier   +9 more
openaire   +2 more sources

Ion implantation technology and ion sources

Review of Scientific Instruments, 2014
Ion implantation (I/I) technology has been developed with a great economic success of industries of VLSI (Very Large-Scale Integrated circuit) devices. Due to its large flexibility and good controllability, the I/I technology has been assuming various challenging requirements of VLSI evolutions, especially in advanced evolutional characteristics of ...
openaire   +2 more sources

Ion sources for ion implantation technology (invited)

Review of Scientific Instruments, 2014
Ion sources for ion implantation are introduced. The technique is applied not only to large scale integration (LSI) devices but also to flat panel display. For LSI fabrication, ion source scheduled maintenance cycle is most important. For CMOS image sensor devices, metal contamination at implanted wafer is most important.
Shigeki, Sakai, Nariaki, Hamamoto, Yutaka, Inouchi, Sei, Umisedo, Naoki, Miyamoto   +4 more
openaire   +2 more sources

RF Negative Ion Sources and Polarized Ion Sources

2016
The requirement of a neutral beam injection system with hydrogen or deuterium beam energy up to 1 MeV for the ITER project has recently triggered new research on negative ion sources, from production to acceleration and neutralization before the injection in the tokamak.
N. Ippolito, F. Taccogna, P. Minelli, V. Variale, N. Colonna   +4 more
openaire   +1 more source

Deuterium ion source

Review of Scientific Instruments, 1996
The experience with an ion source for our atomic injector have been described. Ion beams with a current of 50 A, energy of 30 keV, and pulse duration of 0.1 s are extracted from a rectangular plasma emitter with dimensions 24×12 cm2. The beams have small angular divergence.
G. I. Dimov, A. S. Donin, O. Yu. Marin, I. I. Morozov, V. Ya. Savkin, S. A. Wiebe   +5 more
openaire   +1 more source

Electrohydrodynamic Ion Source

Journal of Applied Physics, 1969
An electrohydrodynamic (EHD) technique is used to generate ions from liquid metals. Liquid metal is fed to the tip of a capillary needle emitter with a voltage difference applied between the emitter and an extractor electrode to produce an intense electric field at the liquid surface. Electrostatic forces overcome surface tension forces to produce ions
John F. Mahoney, Arthur Y. Yahiku, Howard L. Daley, R. David Moore, Julius Perel   +4 more
openaire   +1 more source

Analysis of magnetron ion sources and PIG ion sources

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989
Abstract Magnetron ion sources and PIG ion sources are sources of intense negative ion beams and multiply-charged positive and negative ion beams. They are composed of two electrodes, a sheath and a plasma. The author has classified them into magnetron (MG), inverse magnetron (IM), planar magnetron and Penning ionization gauge (PIG) ion sources.
openaire   +1 more source