Results 251 to 260 of about 305,677 (306)
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Canadian Journal of Research, 1948
Positive ions are formed in a low pressure electrodeless discharge which is excited by the radio-frequency field of a coil coupled to a 15 Mc. per sec. oscillator. The ions are extracted from the discharge through a pumping canal (2 mm. in diameter × 12 mm. in length) by a simple arrangement of electrodes. After further focusing and acceleration to 50
A J, BAYLY, A G, WARD
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Positive ions are formed in a low pressure electrodeless discharge which is excited by the radio-frequency field of a coil coupled to a 15 Mc. per sec. oscillator. The ions are extracted from the discharge through a pumping canal (2 mm. in diameter × 12 mm. in length) by a simple arrangement of electrodes. After further focusing and acceleration to 50
A J, BAYLY, A G, WARD
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Ion sources for ion machining applications
12th International Electric Propulsion Conference, 1976Ion sources with beam diameters of 2.5, 10, and 20 cm have been developed for ion machining applications. All three of these sources use carbon grids to minimize accelerator grid sputtering. A new starting circuit Is also employed that uses only passive components for initiation of the discharge. The two larger sources use a flat multipole chamber with
Harold R. Kaufman +2 more
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Ion implantation technology and ion sources
Review of Scientific Instruments, 2014Ion implantation (I/I) technology has been developed with a great economic success of industries of VLSI (Very Large-Scale Integrated circuit) devices. Due to its large flexibility and good controllability, the I/I technology has been assuming various challenging requirements of VLSI evolutions, especially in advanced evolutional characteristics of ...
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Analysis of magnetron ion sources and PIG ion sources
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989Abstract Magnetron ion sources and PIG ion sources are sources of intense negative ion beams and multiply-charged positive and negative ion beams. They are composed of two electrodes, a sheath and a plasma. The author has classified them into magnetron (MG), inverse magnetron (IM), planar magnetron and Penning ionization gauge (PIG) ion sources.
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RF Negative Ion Sources and Polarized Ion Sources
2016The requirement of a neutral beam injection system with hydrogen or deuterium beam energy up to 1 MeV for the ITER project has recently triggered new research on negative ion sources, from production to acceleration and neutralization before the injection in the tokamak.
N. Ippolito +4 more
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Ion sources for ion implantation technology (invited)
Review of Scientific Instruments, 2014Ion sources for ion implantation are introduced. The technique is applied not only to large scale integration (LSI) devices but also to flat panel display. For LSI fabrication, ion source scheduled maintenance cycle is most important. For CMOS image sensor devices, metal contamination at implanted wafer is most important.
Shigeki, Sakai +4 more
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Development of a microwave ion source for ion implantations
Review of Scientific Instruments, 2015A microwave ion source is expected to have a long lifetime, as it has fewer consumables. Thus, we are in the process of developing a microwave ion source for ion implantation applications. In this paper, we report on a newly developed plasma chamber and the extracted P+ beam currents.
N, Takahashi +7 more
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Characteristics of a multidipole ion source
Review of Scientific Instruments, 1978The properties of a steady-state, dc discharge multidipole ion source have been investigated. The plasma density in the source depends on the magnet geometries, the discharge voltage, and the bias voltage on the first extraction grid. Different schemes to reduce the loss of ions to the chamber wall are described.
K N, Leung +6 more
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Performance of an inverted ion source
Review of Scientific Instruments, 2013Whereas energetic ion beams are conventionally produced by extracting ions (say, positive ions) from a plasma that is held at high (positive) potential, with ion energy determined by the potential drop through which the ions fall in the beam formation electrode system, in the device described here the plasma and its electronics are held at ground ...
M C, Salvadori +6 more
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Atmospheric pressure ion sources
Mass Spectrometry Reviews, 2009AbstractThis review of atmospheric pressure ion sources discusses major developments that have occurred since 1991. Advances in the instrumentation and understanding of the key physical principles are the primary focus. Developments with electrospray and atmospheric pressure chemical ionization and variations encompassing adaptations for surface ...
Thomas R, Covey +2 more
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