Results 261 to 270 of about 305,677 (306)
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Reversal ion source: A new source of negative ion beams
Review of Scientific Instruments, 1985We demonstrate a new type of ion source for producing either pulsed or continuous negative ion beams. The source, dubbed the ‘‘reversal ion source,’’ utilizes an electrostatic ‘‘mirror’’ which reverses trajectories in an electron beam, producing electrons at their turning point having a distribution of velocities centered at zero velocity.
O. J. Orient +2 more
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Review of Scientific Instruments, 2008
Ion source development at KVI is focused on increasing the beam intensity from the electron cyclotron resonance ion source injector and optimizing the beam transport and injection into the superconducting AGOR cyclotron. We describe several modifications that have resulted in a significant performance increase of the ion source.
Beijers, J. P. M. +5 more
openaire +3 more sources
Ion source development at KVI is focused on increasing the beam intensity from the electron cyclotron resonance ion source injector and optimizing the beam transport and injection into the superconducting AGOR cyclotron. We describe several modifications that have resulted in a significant performance increase of the ion source.
Beijers, J. P. M. +5 more
openaire +3 more sources
An ion source research facility
Review of Scientific Instruments, 2008As an ion source developer, D-Pace frequently faces the issue of needing access to a research facility to be able to test equipment or to develop our existing technology further. The closest facility to perform such tasks is hundreds of kilometers away, at TRIUMF, and it is not always feasible to make use of it on a timely basis.
M, Roeder +4 more
openaire +2 more sources
A hollow cathode ion source for production of primary ions for the BNL electron beam ion source
Review of Scientific Instruments, 2014A hollow cathode ion source, based on one developed at Saclay, has been modified significantly and used for several years to produce all primary 1+ ions injected into the Relativistic Heavy Ion Collider Electron Beam Ion Source (EBIS) at Brookhaven. Currents of tens to hundreds of microamperes have been produced for 1+ ions of He, C, O, Ne, Si, Ar, Ti,
James, Alessi +5 more
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Pantechnik new superconducting ion source: PantechniK Indian Superconducting Ion Source
Review of Scientific Instruments, 2012The new ECR ion source PantechniK Indian Superconducting Ion Source (PKISIS) was recently commissioned at Pantechnik. Three superconducting coils generate the axial magnetic field configuration, while the radial magnetic field is done with the multi-layer permanent magnets.
G, Gaubert +9 more
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Review of Scientific Instruments, 1949
An ion source is described which utilizes a hot cathode as an electron source and an axial magnetic field for focusing. The electron beam is pulsed for 250 μsec. 60 times a second. Peak ion currents of 100 ma are readily obtainable. At a hydrogen pressure of 25 microns of Hg the proton content of the beam is between 30 and 40 percent.
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An ion source is described which utilizes a hot cathode as an electron source and an axial magnetic field for focusing. The electron beam is pulsed for 250 μsec. 60 times a second. Peak ion currents of 100 ma are readily obtainable. At a hydrogen pressure of 25 microns of Hg the proton content of the beam is between 30 and 40 percent.
openaire +2 more sources
Ion sources for mass spectrometry II. Filaments for low temperature ion sources
International Journal of Mass Spectrometry and Ion Physics, 1983Abstract Two low power filaments (thin wire rhenium and LaB 6 ) have been designed to allow a chemical ionization ion source to operate below 100°C. Both filaments simplified analysis of the thermally sensitive compound flurazepam using negative chemical ionization mass spectrometry.
L. Kelner +4 more
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Gas discharge ion source III. Modified Berkeley multifilament ion source
Review of Scientific Instruments, 1978Total ion current, ion energy, mass and current density distributions, and the impurity content of the ion beams produced by a modified Berkeley multifilament ion source (MFIS) were measured as a function of source configuration, gas pressure, and operating conditions: the ’’best’’ configuration produced beams of 200 mA or more at pressures between 0 ...
R W, Bickes, F M, Bacon, J B, O'Hagan
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Ion sources for use in ion implantation
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1989Abstract This paper reviews high current ion sources suitable for commercial use. Although the production of high currents of a variety of ions is a vital consideration, this paper focuses on other aspects of ion source performance. The modern ion implanter is a major item of expensive capital equipment, with the ion source being its least reliable ...
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