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An apparatus for isothermal annealing and crystallisation of amorphous semiconducting films
Journal of Physics E: Scientific Instruments, 1983An apparatus for isothermal annealing and study of crystallisation temperatures and activation energies in amorphous semiconductors is described. The temperature treatment is performed in a high-vacuum chamber with an ambient argon gas maintained during the annealing time.
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Isothermal annealing of ion-bombardment-induced amorphousness in semiconductors
Journal of Physics D: Applied Physics, 1996A theoretical model is presented to describe the isothermal annealing of semiconductors partially amorphized by ion bombardment. The annealing behaviour of amorphous zones is approximated by first-order reaction kinetics and the increasing complexity of amorphousness with the fraction of material amorphized is approximated by a population of activated ...
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Isothermal annealing of reactor irradiated crystalline chemical compounds
Journal of Inorganic and Nuclear Chemistry, 1968Abstract The isothermal annealing of crystalline potassium chromate and trisethylenediamine cobalt(III) nitrate irradiated in a nuclear reactor has been extensively examined. A total of 1200 analyses were carried out to construct, in a more precise form, isothermal curves.
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An isothermal anneal study of carbonyl iron
Journal of the Franklin Institute, 1955L. Muldawer, F.E. Jaumot
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Swelling of irradiated beryllium during isothermal annealing
Soviet Atomic Energy, 1973G. A. Sernyaev +2 more
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Crystallization of the Fe81B13.5Si3.5C2 Amorphous System by Isothermal Annealing
Physica Status Solidi (a), 1992M. Sorescu, S. Stenger, U. Gonser
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Isothermal annealing of cast iron diesel sleeves
Metal Science and Heat Treatment, 1968Yu. G. Bobro, N. F. Vasilevskii
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Two-step relaxations in metallic glasses during isothermal annealing
Intermetallics, 2018Juntao Huo, J Q Wang
exaly

