Results 71 to 80 of about 243,893 (286)

Wet‐Chemical Etching of Silicon Wafer Surfaces Using Aqueous HF‐HBrO3 and HF‐HBrO3‐Br2 Solutions

Advanced Materials Interfaces
Solutions containing hydrofluoric acid (HF) and bromic acid (HBrO3) are investigated as nitrogen oxide (NOx)‐free mixtures for wet‐chemical etching of (100) silicon wafer surfaces. Isotropic etching behavior with high dissolution rates of up to 10 µm min−
Nils Schubert, Niklas Zomack, Ann‐Lucia Neumann, André Stapf, Dominic Walter, Andreas Lißner, Andreas Siegfried Braeuer, Edwin Kroke   +7 more
doaj   +1 more source

Etching of the Relocated American House by Bernhardt Wall

, 2023
This print features an etching by Bernhardt Wall. This print was created in 1934. This etching features the American House, Carlinville, Illinois.https://scholarsjunction.msstate.edu/fvw-prints/2000/thumbnail ...
etching by Bernhardt Wall (American, 1872-1956)
core  

Controlling Polystyrene Particle Distribution in Colloidal Lithography For Correlated‐Disorder Structures

Advanced Optical Materials, EarlyView.
Colloidal lithography is a low‐cost, simple and scalable technique to fabricate correlated‐disorder nanostructures for light‐trapping in solar cells. This work investigates the control of polystyrene particle distribution in colloidal lithography, highlighting the importance of particle surface functionalization as well as the ability to tune the ...
Laura de Almeida, Jean‐Baptiste Doucet, Mathieu Arribat, Guilhem Almuneau, Stéphane Collin, Inès Revol   +5 more
wiley   +1 more source

Etching of Confederate Prison in Washington, D.C. by Bernhardt Wall

, 2023
This print features an etching by Bernhardt Wall. This print was created in 1939. This etching is entitled Confederate Prison, Washington, D.C.
etching by Bernhardt Wall (American, 1872-1956)
core  

Inverse‐Designed Superchiral Hot Spot in Dielectric Meta‐Cavity Toward Ultra‐Compact Enantioselective Detection

Advanced Optical Materials, EarlyView.
Linearly polarized incident light with normal incidence creates enhanced optical chirality hotspots on the metasurface. Several orders of magnitude optical chirality enhancement offers a promising route toward highly sensitive, compact chiral spectroscopy.
Anastasia Romashkina, Omer Yesilurt, Vahagn Mkhitaryan, Owen Matthiessen, Min Jiang, Evgeny Lyubin, Bayarjargal N. Tugchin, Isabelle Staude, Jer‐Shing Huang, Thomas Pertsch, Alexander V. Kildishev   +10 more
wiley   +1 more source

EFFECT OF OXYGEN ON SI ETCH PROFILE USING DC SF6 PLASMA MICROMACHINING

Diyala Journal of Engineering Sciences, 2010
Plasma etching with tapered profile structure (high aspect ratio structures) in silicon is an important step in manufacturing capacitors for memory devices and integrated components of microelectromechanical systems. In these applications, the goal is to
Shrok Abdullah
doaj  

Etching of The Brewster House in Freeport, Illinois

, 2023
This print features an etching by Bernhardt Wall. This print was created in 1929 and is entitled The Brewster House, Freeport, Ill., where Lincoln stopt on Aug. 27th, 1858.
etching by Bernhardt Wall (American, 1872-1956)
core  

Coherent Absorption Reveals Colors Hidden in a Grey Fabry–Pérot Cavity

Advanced Optical Materials, EarlyView.
A dielectric thin film shows colors depending on its thickness; this effect can be used to encode information normally accessible through single‐beam spectroscopy. We developed a method to conceal this kind of information, based on coating the dielectric with a matched conductor, that suppresses the color‐bearing thin‐film resonances.
Giuseppe E. Lio, Giulio Carotta, Lorenzo Lavista, Andrea Camposeo, Giacomo Venturi, Agnese Guernieri, Alessandro Pitanti, Simon A. R. Horsley, Giuseppe C. La Rocca, Alessandro Tredicucci, Simone Zanotto   +10 more
wiley   +1 more source

A Comprehensive Study of NF₃-Based Selective Etching Processes: Application to the Fabrication of Vertically Stacked Horizontal Gate-All-around Si Nanosheet Transistors

Nanomaterials
In this paper, we demonstrate a comprehensive study of NF3-based selective etching processes for inner spacer formation and for channel release, enabling stacked horizontal gate-all-around Si nanosheet transistor architectures.
Xin Sun, Jiayang Li, Lewen Qian, Dawei Wang, Ziqiang Huang, Xinlong Guo, Tao Liu, Saisheng Xu, Liming Wang, Min Xu, David Wei Zhang   +10 more
doaj   +1 more source

Energy Harvesting Thermoelectric Generators Manufactured Using the Complementary Metal Oxide Semiconductor Process

Sensors, 2013
This paper presents the fabrication and characterization of energy harvesting thermoelectric micro generators using the commercial complementary metal oxide semiconductor (CMOS) process.
Wen-Jung Tsai, Ming-Zhi Yang, Ching-Liang Dai, Chyan-Chyi Wu   +3 more
doaj   +1 more source