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A Study on the O2 Plasma Etching Method of Spray-Formed SWCNT Films and Their Utilization as Electrodes for Electrochemical Sensors [PDF]
Sensors, 2023 In this study, we analyzed the morphological changes and molecular structure changes on the surface of single-walled carbon nanotube (SWCNT) films during oxygen plasma (O2) etching of SWCNT surfaces formed by the spray method and analyzed their potential
Jinkyeong Kim +2 more
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A Facile, Low-Cost Plasma Etching Method for Achieving Size Controlled Non-Close-Packed Monolayer Arrays of Polystyrene Nano-Spheres [PDF]
Nanomaterials, 2019 Monolayer nano-sphere arrays attract great research interest as they can be used as templates to fabricate various nano-structures. Plasma etching, and in particular high-frequency plasma etching, is the most commonly used method to obtain non-close ...
Yun Chen +6 more
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ExplorationPlasma etching treatment is an effective strategy to improve the electrocatalytic activity, but the improvement mechanism is still unclear. In this work, a nitrogen‐doped carbon nanotube‐encased iron nanoparticles (Fe@NCNT) catalyst is synthesized as the
Peng Rao +11 more
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SF6 Optimized O2 Plasma Etching of Parylene C [PDF]
Micromachines, 2018 Parylene C is a widely used polymer material in microfabrication because of its excellent properties such as chemical inertness, biocompatibility and flexibility.
Lingqian Zhang +3 more
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Enhancing uniformity in HARC etching via edge bias voltage and structural impedance variations in a rectangular voltage waveform [PDF]
Scientific ReportsIn the semiconductor industry, plasma etching has become a key process for fabricating precise and reliable patterns with high aspect ratios capacitors (HARC), allowing for complex device architectures.
Chanho Park +3 more
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Applied Sciences, 2022 During the oxide layer etching process, particles in capacitively coupled plasma etching equipment adhere to the wafer edge and cause defects that reduce the yield from semiconductor wafers.
Ching-Ming Ku, Stone Cheng
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Wet Chemical and Plasma Etching of Photosensitive Glass
Solids, 2023 Photosensitive glasses for radiation-induced 3D microstructuring, due to their optical transparency and thermal, mechanical, and chemical resistance, enable the use of new strategies for numerous microscale applications, ranging from optics to biomedical
Ulrike Brokmann +4 more
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Effect of Plasma Etching Depth on Subsurface Defects in Quartz Crystal Elements
Crystals, 2023 After the plasma etching of quartz crystal, the crystal lattice underwent changes in response to the length of plasma etching time. The lattice arrangement of quartz crystal was the most orderly after plasma etching for 1000 nm, and with the increase in ...
Qingzhi Li +4 more
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Nanomaterials, 2022 SiO2 etching characteristics were investigated in detail. Patterned SiO2 was etched using radio-frequency capacitively coupled plasma with pulse modulation in a mixture of argon and fluorocarbon gases.
Won-nyoung Jeong +4 more
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Dry etching of monocrystalline silicon using a laser-induced reactive micro plasma
Applied Surface Science Advances, 2021 Dry etching is a prevalent technique for pattern transfer and material removal in microelectronics, optics and photonics due to its high precision material removal with low surface and subsurface damage.
Robert Heinke +3 more
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