Results 1 to 10 of about 2,786,485 (335)

Understanding the improvement mechanism of plasma etching treatment on oxygen reduction reaction catalysts

open access: yesExploration, 2023
Plasma etching treatment is an effective strategy to improve the electrocatalytic activity, but the improvement mechanism is still unclear. In this work, a nitrogen‐doped carbon nanotube‐encased iron nanoparticles (Fe@NCNT) catalyst is synthesized as the
Peng Rao   +11 more
doaj   +4 more sources

A Facile, Low-Cost Plasma Etching Method for Achieving Size Controlled Non-Close-Packed Monolayer Arrays of Polystyrene Nano-Spheres [PDF]

open access: yesNanomaterials, 2019
Monolayer nano-sphere arrays attract great research interest as they can be used as templates to fabricate various nano-structures. Plasma etching, and in particular high-frequency plasma etching, is the most commonly used method to obtain non-close ...
Yun Chen   +6 more
doaj   +3 more sources

Anisotropic etching of graphite and graphene in a remote hydrogen plasma [PDF]

open access: yesnpj 2D Materials and Applications, 2017
Nanofabrication: remote etching of graphene on hBN is highly anisotropic Etching of graphite with hydrogen plasma gives rise to two distinct etching regimes, governed by the degree of direct plasma exposure. A team led by D. M.
D. Hug   +8 more
doaj   +3 more sources

A Study on the O2 Plasma Etching Method of Spray-Formed SWCNT Films and Their Utilization as Electrodes for Electrochemical Sensors [PDF]

open access: yesSensors, 2023
In this study, we analyzed the morphological changes and molecular structure changes on the surface of single-walled carbon nanotube (SWCNT) films during oxygen plasma (O2) etching of SWCNT surfaces formed by the spray method and analyzed their potential
Jinkyeong Kim   +2 more
doaj   +2 more sources

Robust Superhydrophobic Cotton Fibers Prepared by Simple Dip-Coating Approach Using Chemical and Plasma-Etching Pretreatments. [PDF]

open access: yesACS Omega, 2019
The preparation of superhydrophobic textiles with high mechanical and chemical durability is challenging. Here, facile and fluorine-free methods, using alkali and plasma-etching treatments, followed by the addition of silica nanoparticles and tetraethyl ...
Nguyen-Tri P   +5 more
europepmc   +2 more sources

Toward reliable morphology assessment of thermosets via physical etching: Vinyl ester resin as an example [PDF]

open access: yeseXPRESS Polymer Letters, 2013
The morphology of peroxide-cured, styrene crosslinked, bisphenol A-based vinyl ester (VE) resin was investigated by atomic force microscopy (AFM) after ‘physical’ etching with different methods.
J. Karger-Kocsis   +5 more
doaj   +3 more sources

Atomic-layer soft plasma etching of MoS2. [PDF]

open access: yesSci Rep, 2016
Transition from multi-layer to monolayer and sub-monolayer thickness leads to the many exotic properties and distinctive applications of two-dimensional (2D) MoS2. This transition requires atomic-layer-precision thinning of bulk MoS2 without damaging the
Xiao S   +8 more
europepmc   +2 more sources

Selective Plasma Etching of Polymeric Substrates for Advanced Applications. [PDF]

open access: yesNanomaterials (Basel), 2016
In today’s nanoworld, there is a strong need to manipulate and process materials on an atom-by-atom scale with new tools such as reactive plasma, which in some states enables high selectivity of interaction between plasma species and materials.
Puliyalil H, Cvelbar U.
europepmc   +2 more sources

SF6 Optimized O2 Plasma Etching of Parylene C [PDF]

open access: yesMicromachines, 2018
Parylene C is a widely used polymer material in microfabrication because of its excellent properties such as chemical inertness, biocompatibility and flexibility.
Lingqian Zhang   +3 more
doaj   +2 more sources

Enhancing uniformity in HARC etching via edge bias voltage and structural impedance variations in a rectangular voltage waveform [PDF]

open access: yesScientific Reports
In the semiconductor industry, plasma etching has become a key process for fabricating precise and reliable patterns with high aspect ratios capacitors (HARC), allowing for complex device architectures.
Chanho Park   +3 more
doaj   +2 more sources

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