Results 11 to 20 of about 27,754 (260)

Formation of Functional Silicon Nitride Layers by Selective Plasmochemical Etching

Доклады Белорусского государственного университета информатики и радиоэлектроники, 2022
At present, with the development of nanotechnology, plasma-chemical etching remains practically the only tool for transferring an integrated circuit pattern in a masking layer to a substrate material due to the fact that the pattern transfer accuracy is ...
V. V. Emelyanov
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Etching of a fluoropolymer coating synthesized by the hot wire chemical vapor deposition method in a low-frequency induction discharge plasma [PDF]

E3S Web of Conferences
The process of plasma etching for the formation of a biphilic pattern in a continuous homogeneous fluoropolymer coating on a copper substrate is studied.
Petrova Anna, Pinaev Vadim, Safonov Alexey, Khmel Sergey   +3 more
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Study of Atmospheric Pressure Plasma Temperature Based on Silicon Carbide Etching

Micromachines, 2023
In order to further understand the excitation process of inductively coupled plasma (ICP) and improve the etching efficiency of silicon carbide (SiC), the effect of temperature and atmospheric pressure on plasma etching of silicon carbide was ...
Shaozhen Xu, Julong Yuan, Jianxing Zhou, Kun Cheng, Hezhong Gan   +4 more
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Anisotropic etching of graphite and graphene in a remote hydrogen plasma

npj 2D Materials and Applications, 2017
Nanofabrication: remote etching of graphene on hBN is highly anisotropic Etching of graphite with hydrogen plasma gives rise to two distinct etching regimes, governed by the degree of direct plasma exposure. A team led by D. M.
D. Hug, S. Zihlmann, M. K. Rehmann, Y. B. Kalyoncu, T. N. Camenzind, L. Marot, K. Watanabe, T. Taniguchi, D. M. Zumbühl   +8 more
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Advanced Etching Techniques of LiNbO₃ Nanodevices

Nanomaterials, 2023
Single LiNbO3 (LNO) crystals are widely utilized in surface acoustic wave devices, optoelectronic devices, and novel ferroelectric memory devices due to their remarkable electro-optic and piezoelectric properties, and high saturation and remnant ...
Bowen Shen, Di Hu, Cuihua Dai, Xiaoyang Yu, Xiaojun Tan, Jie Sun, Jun Jiang, Anquan Jiang   +7 more
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Advances in precision freeform manufacturing by plasma jet machining -INVITED [PDF]

EPJ Web of Conferences, 2020
Atmospheric pressure plasma jet machining technology provides a flexible and efficient way to fabricate precise freeform optics. Due to the pure chemical material removal mechanism based on a dry etching process using fluorine containing gas, the choice ...
Arnold Thomas, Boehm Georg, Kazemi Faezeh   +2 more
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Atmospheric pressure plasma directed assembly during photoresist removal: A new route to micro and nano pattern formation

Micro and Nano Engineering, 2019
We propose a new route for pattern formation based on atmospheric pressure plasma directed assembly during photoresist removal. Atmospheric plasma etching of AZ5214E resist coated on Silicon leads to the formation of periodic, oxygen-plasma resistant ...
P. Dimitrakellis, A. Smyrnakis, V. Constantoudis, D. Tsoutsou, A. Dimoulas, E. Gogolides   +5 more
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Dry etching of ternary metal carbide TiAlC via surface modification using floating wire-assisted vapor plasma

Scientific Reports, 2022
Dry etching of ternary metal carbides TiAlC has been first developed by transferring from wet etching to dry etching using a floating wire (FW)-assisted Ar/ammonium hydroxide vapor plasma. FW-assisted non-halogen vapor plasma generated at medium pressure
Thi-Thuy-Nga Nguyen, Kazunori Shinoda, Hirotaka Hamamura, Kenji Maeda, Kenetsu Yokogawa, Masaru Izawa, Kenji Ishikawa, Masaru Hori   +7 more
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Effect of plasma process on n-GaN surface probed with electrochemical short loop

Power Electronic Devices and Components, 2023
Plasma etching treatments are important steps in GaN-based devices fabrication, but can create defects on GaN surfaces. These surface defects can strongly alter device performances.
Carole Pernel, William Berthou, Sidharth Suman, Simon Ruel, Laura Vauche   +4 more
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Micro-texturing into DLC/diamond coated molds and dies via high density oxygen plasma etching

Manufacturing Review, 2015
Diamond-Like Carbon (DLC) and Chemical Vapor Deposition (CVD)-diamond films have been widely utilized not only as a hard protective coating for molds and dies but also as a functional substrate for bio-MEMS/NEMS.
Yunata Ersyzario Edo, Aizawa Tatsuhiko
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