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Advances in precision freeform manufacturing by plasma jet machining -INVITED [PDF]
EPJ Web of Conferences, 2020 Atmospheric pressure plasma jet machining technology provides a flexible and efficient way to fabricate precise freeform optics. Due to the pure chemical material removal mechanism based on a dry etching process using fluorine containing gas, the choice ...
Arnold Thomas +2 more
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Micro and Nano Engineering, 2019 We propose a new route for pattern formation based on atmospheric pressure plasma directed assembly during photoresist removal. Atmospheric plasma etching of AZ5214E resist coated on Silicon leads to the formation of periodic, oxygen-plasma resistant ...
P. Dimitrakellis +5 more
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Effect of plasma process on n-GaN surface probed with electrochemical short loop
Power Electronic Devices and Components, 2023 Plasma etching treatments are important steps in GaN-based devices fabrication, but can create defects on GaN surfaces. These surface defects can strongly alter device performances.
Carole Pernel +4 more
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Micro-texturing into DLC/diamond coated molds and dies via high density oxygen plasma etching
Manufacturing Review, 2015 Diamond-Like Carbon (DLC) and Chemical Vapor Deposition (CVD)-diamond films have been widely utilized not only as a hard protective coating for molds and dies but also as a functional substrate for bio-MEMS/NEMS.
Yunata Ersyzario Edo, Aizawa Tatsuhiko
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Scientific Reports, 2022 Dry etching of ternary metal carbides TiAlC has been first developed by transferring from wet etching to dry etching using a floating wire (FW)-assisted Ar/ammonium hydroxide vapor plasma. FW-assisted non-halogen vapor plasma generated at medium pressure
Thi-Thuy-Nga Nguyen +7 more
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Studies on etching and polymer deposition in halocarbon plasmas [PDF]
, 1987 Plasma etching, the selective removal of materials by reaction with chemically active species formed in a glow-discharge, is widely used by the electronics industry because of the advantages over 'wet' processes. The full potential has yet to be realised
Astell-Burt, P. J. +1 more
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Metal-Assisted Plasma Etching of Silicon: A Liquid-Free Alternative to MACE [PDF]
, 2018 For decades, fabrication of semiconductor devices has utilized well-established etching techniques to create complex nanostructures in silicon. Of these, two of the most common are reactive ion etching in the gaseous phase and metal-assisted chemical ...
Benjamin Almquist +5 more
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In-line plasma-chemical etching of crystalline silicon solar wafers at atmospheric pressure
, 2022 S.979-984Atmospheric pressure plasma technologies are a potential substitution for wet chemical and vacuum processes in the production of crystalline silicon solar cells, leading to a simplified in-line processing chain.
Linaschke, D. +7 more
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Nanomaterials, 2022 In the semiconductor industry, fluorocarbon (FC) plasma is widely used in SiO2 etching, with Ar typically employed in the dilution of the FC plasma due to its cost effectiveness and accessibility.
Youngseok Lee +7 more
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High-rate anisotropic silicon etching with the expanding thermal plasma technique [PDF]
, 2006 Deep anisotropic silicon etching with the expanding thermal plasma (ETP) technique using fluorine-based chemistries was demonstrated. The ETP technique makes use of a remote high-d.
Sanden, MCM Richard van de +9 more
core +3 more sources