Results 21 to 30 of about 118 (102)
Spiral Crystal Growth in the Czochralski Process—Revisited, with New Interpretations
This review deals first with the spontaneous transition of cylindrically growing Czochralski crystals to the growth in spiral morphology. Further, the growth of a full spiral is described considering the azimuthal growth in the off‐centered rotating melt meniscus.
Dietrich G. Schwabe
wiley +1 more source
Automated Growth of Si1−xGex Single Crystals with Constant Axial Gradient by Czochralski Technique
This contribution proposes a method for the automated growth of silicon–germanium (SiGe) crystals. To be used as X‐ray and γ‐ray monochromators such crystals must have a constant germanium concentration gradient in their body. This can be achieved by growing them in a special shape.
Nikolay V. Abrosimov +3 more
wiley +1 more source
Fast and Slow Stages of Lifetime Degradation by Boron–Oxygen Centers in Crystalline Silicon
Apparently contradicting experiments on the light‐induced degradation (LID) in boron‐doped oxygen‐containing crystalline silicon are resolved by introduction of a concept of different kinds of activating impurities participating in boron–oxygen recombination centers.
Jan Schmidt +3 more
wiley +1 more source
Temperature Measurement Using Optical Fiber Methods: Overview and Evaluation
The paper deals with the overview of fiber optic methods suitable for temperature measurement and monitoring. The aim is to evaluate the current research of temperature measurements in the interval from temperature close to 0 up to 1000°C. Since the measuring chain is a functional combination of optical methods, optical fiber properties, and other ...
Martin Mikolajek +9 more
wiley +1 more source
This article evaluates the situation of two renowned scientists in Poland, namely the microbiologist and serologist Ludwik Hirszfeld (1884–1954), and the metallurgist Jan Czochralski (1885–1953), during the time of the German occupation from 1939–45. Both scientists strove to continue their scientific work even under the conditions of occupation but ...
openaire +1 more source
This work presents a compact induction heating system for time‐resolved in situ X‐ray diffraction imaging. The system enables contact‐free volumetric heating up to approximately 1600°C and provides flexible operation in different operating modes. Its performance is demonstrated through representative diffraction imaging experiments.We present a compact
Merve P. Kabukcuoglu +6 more
wiley +1 more source
Jan Czochralski – pionier światowej elektroniki i inżynierii materiałowej
Artykuł ma na celu przedstawienie sylwetki Jana Czochralskiego, światowej sławy naukowca XX w. Jego głównym osiągnięciem było wynalezienie metody uzyskiwania monokryształów, do dziś stosowanej w produkcji układów scalonych wielkiej skali integracji. Po zakończeniu II wojny światowej Czochralski całkowicie bezpostawnie został oskarżony o kolaborację z ...
openaire +2 more sources
Structure and properties of (Nd,Sr)(Al,Ta)O3 (NSAT) substrate crystals
An emerging cubic substrate material (Nd,Sr)(Al,Ta)O3 (NSAT) has been structurally and spectroscopically characterized revealing that the nominally cubic NSAT consists of partially developed cubic superstructure domains with doubled unit‐cell parameter.
Roberts Blukis +10 more
wiley +1 more source
TOPCon Solar Cells Made of n‐Type and p‐Type Epitaxially Grown Silicon Wafers
This study investigates the suitability of epitaxially grown silicon wafers for tunnel oxide passivating contact (TOPCon) solar cells in particular the high temperature stability required for boron emitter diffusion. Efficiencies up to 24.4% and 24.7% for n‐type and p‐type wafers were achieved, respectively, which demonstrate the suitability of ...
Armin Richter +8 more
wiley +1 more source
Bifacial passivated emitter and rear cells (PERC+) can suffer from a potential‐induced degradation (PID) at the rear side. A microstructural analysis shows localized spots with increased carrier recombination as the origin of the power losses. A corrosion of the silicon bulk at the silicon/aluminium oxide interface is the root cause of the degradation.
Kai Sporleder +7 more
wiley +1 more source

