Results 131 to 140 of about 301,025 (376)

One Binder to Bind Them All

Sensors, 2016
High quality binders, such as antibodies, are of critical importance for chemical sensing applications. With synthetic alternatives, such as molecularly imprinted polymers (MIPs), less sensor development time and higher stability of the binder can be ...
Oliver Hayden
doaj   +1 more source

All‐in‐One Analog AI Hardware: On‐Chip Training and Inference with Conductive‐Metal‐Oxide/HfOx ReRAM Devices

Advanced Functional Materials, EarlyView.
An all‐in‐one analog AI accelerator is presented, enabling on‐chip training, weight retention, and long‐term inference acceleration. It leverages a BEOL‐integrated CMO/HfOx ReRAM array with low‐voltage operation (<1.5 V), multi‐bit capability over 32 states, low programming noise (10 nS), and near‐ideal weight transfer.
Donato Francesco Falcone, Victoria Clerico, Wooseok Choi, Tommaso Stecconi, Folkert Horst, Laura Bégon‐Lours, Matteo Galetta, Antonio La Porta, Nikhil Garg, Fabien Alibart, Bert Jan Offrein, Valeria Bragaglia   +11 more
wiley   +1 more source

Ion beam lithography for Fresnel zone plates in X-ray microscopy

, 2013
Fresnel Zone Plates (FZP) are to date very successful focusing optics for X-rays. Established methods of fabrication are rather complex and based on electron beam lithography (EBL).
Achim Nadzeyka, Baciocchi, Baglin, Bionta, Bourzac, Bruchhaus, Chao, Chao, Cho, Corinne Grévent, Eberhard Goering, Falcone, Fuchs, Gelb, Gerd Schneider, Gierak, Gierak, Gisela Schütz, Guilherme, Hanfei Yan, Ice, Ilinski, Joan Vila-Comamala, Joy, Kahraman Keskinbora, Kaulich, Kuyumchyan, Lloyd Peto, Mangles, Markus Weigand, Maser, Mayer, Michael Bechtel, Nachtrab, Nadzeyka, Popmintchev, Rehbein, Rolf Follath, Rudolph, Sakdinawat, Stefan Rehbein, Stiglian, Surpi, Tseng, Vila-Comamala, Vladimirsky, Wu, Yan, Yi, Zschech   +49 more
core   +1 more source

Current challenges and opportunities for EUV lithography

Photomask Technology, 2018
The semiconductor industry is on the threshold of using extreme ultraviolet (EUV) lithography in high volume manufacturing (HVM). Nevertheless, there are several areas where improvement in this lithographic technology would be very beneficial, most ...
H. Levinson, T. Brunner
semanticscholar   +1 more source

Holographic interference lithography for integrated optics [PDF]

, 1978
W. Ng, Chi-Shain Hong, A. Yariv
openalex   +1 more source

A Universal Biomimetic Approach for Making Artificial Antigen‐Presenting Cells for T Cell Activation

Advanced Functional Materials, EarlyView.
This study shows a biomimetic silica microcapsule (SMC) fabrication method under mild conditions for making artificial antigen‐presenting cells (aAPCs). Inspired by marine biomineralization, peptide‐mediated biosilicification enables silica shell formation on emulsion templates. The resulting SMCs possess a core–shell structure, controlled fluorescence
Fei Hou, Supun Ranaweera, Xiangke Li, Ruirui Qiao, Yue Hui, Chun‐Xia Zhao   +5 more
wiley   +1 more source

Nanoimprint lithography for high-throughput fabrication of metasurfaces

Frontiers of Optoelectronics, 2021
D. Oh, Taejun Lee, Byoungsu Ko, Trevon Badloe, J. Ok, J. Rho   +5 more
semanticscholar   +1 more source

Nanosphere lithography for optical fiber tip nanoprobes

Light: Science & Applications, 2016
This paper reports a simple and economical method for the fabrication of nanopatterned optical fiber nanotips. The proposed patterning approach relies on the use of the nanosphere lithography of the optical fiber end facet.
M. Pisco, F. Galeotti, G. Quero, G. Grisci, A. Micco, L. Mercaldo, P. D. Veneri, A. Cutolo, A. Cusano   +8 more
semanticscholar   +1 more source

Using Higher Diffraction Orders to Improve the Accuracy and Robustness of Overlay Measurements

Micromachines
This paper introduces a method for improving the measurement performance of single wavelength overlay errors by incorporating higher diffraction orders. In this method, to enhance the accuracy and robustness of overlay error detection between layers, the
Shaoyu Liu, Yan Tang, Xiaolong Cheng, Yuliang Long, Jinfeng Jiang, Yu He, Lixin Zhao   +6 more
doaj   +1 more source

Application of moiré techniques in scanning-electron-beam lithography and microscopy [PDF]

, 1975
Henry I. Smith, S. R. Chinn, P. D. DeGraff   +2 more
openalex   +1 more source