Results 181 to 190 of about 223,528 (342)

Ultra-high precision nano additive manufacturing of metal oxide semiconductors via multi-photon lithography [PDF]

Chun Cao, Xianmeng Xia, Xiaoming Shen, Xiaobing Wang, Zhenyao Yang, Qiulan Liu, Chenliang Ding, Dazhao Zhu, Cuifang Kuang, Xü Liu   +9 more
openalex   +1 more source

Model-informed deep learning for computational lithography with partially coherent illumination

, 2020
Xianqiang Zheng, Xu Ma, Qile Zhao, Yihua Pan, Gonzalo R. Arce   +4 more
openalex   +1 more source

Fluorine-Rich Zinc Oxoclusters as Extreme Ultraviolet Photoresists: Chemical Reactions and Lithography Performance

, 2022
Neha Thakur, Michaela Vockenhuber, Yasin Ekinci, Benjamin Watts, Angelo Giglia, Nicola Mahne, S. Nannarone, Sonia Castellanos, Albert M. Brouwer   +8 more
openalex   +1 more source

Conductive Bonding and System Architectures for High‐Performance Flexible Electronics

Advanced Functional Materials, EarlyView.
This review outlines bonding technologies and structural design strategies that support high‐performance flexible and stretchable electronics. Bonding approaches such as surface‐activated bonding and anisotropic conductive films, together with system‐level architectures including buffer layers and island‐bridge structures, possess distinct mechanical ...
Kazuma Nakajima, Kenjiro Fukuda
wiley   +1 more source

High-Efficiency Fiber Edge Coupling for Silicon Nitride Integrated Photonics. [PDF]

Micromachines (Basel)
Avdeev SS, Baburin AS, Sergeev EV, Kramarenko AB, Belyaev AV, Kushnev DV, Buzaverov KA, Stepanov IA, Echeistov VV, Loginov AS, Bukatin SV, Amiraslanov AS, Lotkov ES, Baklykov DA, Rodionov IA.   +14 more
europepmc   +1 more source

Indirect Band Edge and Chain‐Locked Linear Dichroism in the Quasi‐1D Van der Waals Antiferromagnet AgCrP2S6

Advanced Functional Materials, EarlyView.
AgCrP2S6 reveals a momentum‐indirect band edge (≈1.35 eV) and chain‐locked linear dichroism: the first direct transitions emerge at 1.6–1.8 eV for E||a. Resonant Raman and photoemission corroborate this assignment. In ACPS/graphene heterostructures, photocurrent turns on above ≈1.5 eV and follows the same polarization selection rules (anisotropy ≈0.53),
Oleksandr Volochanskyi, Sabrina Juergensen, Václav Valeš, Kumari Surbhi, Martin Mergl, Kseniia Mosina, Zdeněk Sofer, Jan Honolka, Patryk Kusch, Martin Kalbáč   +9 more
wiley   +1 more source

Patterning Fidelity Enhancement and Aberration Mitigation in EUV Lithography Through Source-Mask Optimization. [PDF]

Micromachines (Basel)
Wang Q, Wu Q, Li Y, Liu X, Li Y.
europepmc   +1 more source

Facile modification of freestanding silicon nitride microcantilever beams by dry film photoresist lithography

, 2018
Madeleine Nilsen, Fabian Port, Michael Roos, Kay‐Eberhard Gottschalk, Steffen Strehle   +4 more
openalex   +1 more source

Programmable In‐Situ Interactions Between Resins and Photopolymerized Structures for Seamlessly Integrated Optical Manufacturing of Microlenses

Advanced Functional Materials, EarlyView.
This study presents a dynamic interaction between liquid resins and photopolymerized structures enabled by an in situ light‐writing setup. By controlling a three‐phase interface through localized photopolymerization, which provides physical confinement for the remaining uncured resin regions, the approach establishes a programmable pathway that ...
Kibeom Kim, Sangmin Oh, Kahyun Hur, Hyesung Cho   +3 more
wiley   +1 more source

Interference Field Control for High-Uniformity Nanopatterning: A Review. [PDF]

Sensors (Basel)
Li J, Li X.
europepmc   +1 more source