High power light source for future extreme ultraviolet lithography based on energy-recovery linac free-electron laser [PDF]
, 2022 Hiroshi Kawata +4 more
openalex +1 more source
Positive‐Tone Nanolithography of Antimony Trisulfide with Femtosecond Laser Wet‐Etching
Advanced Functional Materials, EarlyView.A butyldithiocarbamic acid (BDCA) etchant is used to fabricate various micro‐ and nanoscale structures on amorphous antimony trisulfide (a‐Sb2S3) thin film via femtosecond laser etching. Numerical analysis and experimental results elucidate the patterning mechanism on gold (reflective) and quartz (transmissive) substrates.
Abhrodeep Dey +12 more
wiley +1 more source
Robust and adjustable C-shaped electron vortex beams
New Journal of Physics, 2017 Wavefront engineering is an important quantum technology, often applied to the production of states carrying orbital angular momentum (OAM). Here, we demonstrate the design and production of robust C-shaped beam states carrying OAM, in which the usual ...
M Mousley +3 more
doaj +1 more source
«Черно-белое и цветное». Заметки с персональной выставки Татьяны Ашкинази
Искусство Евразии, 2017 Татьяна Ашкинази – известный в Сибири художник-график. Профессиональное мастерство она совершенствовала в художественной студии В.Ф. Рублёва, в Домах творчества СХ СССР.
Сидорова, О.В.
doaj +1 more source
Characterization of PECVD Silicon Nitride Photonic Components at 532 and 900 nm Wavelength [PDF]
, 2014 Low temperature PECVD silicon nitride photonic waveguides have been fabricated by both electron beam lithography and 200 mm DUV lithography. Propagation losses and bend losses were both measured at 532 and 900 nm wavelength, revealing sub 1dB/cm ...
Baets, Roel +16 more
core +2 more sources
Clean‐Limit 2D Superconductivity in a Thick Exfoliated Kagome Film
Advanced Functional Materials, EarlyView.This study reports clean‐limit 2D superconductivity in a thick kagome system, analogous to the 3D case. It observes a drop in superfluid stiffness near the superconducting transition and a cusp‐like feature in the angular dependence of the upper critical field.
Fei Sun +3 more
wiley +1 more source
EUV-Induced Plasma: A Peculiar Phenomenon of a Modern Lithographic Technology
Applied Sciences, 2019 After a long period of relatively low interest, science related to effects in the Extreme Ultraviolet (EUV) spectrum range experienced an explosive boom of publications in the last decades.
Job Beckers +4 more
doaj +1 more source
Quantum Imaging beyond the Diffraction Limit by Optical Centroid Measurements
, 2009 I propose a quantum imaging method that can beat the Rayleigh-Abbe diffraction limit and achieve de Broglie resolution without requiring a multiphoton absorber as the detector. Using the same non-classical states of light as those for quantum lithography,
Tsang, Mankei
core +1 more source
Single‐Step Synthesis of In‐plane 1T'‐2H Heterophase MoTe2 for Low‐Resistance Contacts
Advanced Functional Materials, EarlyView.A single‐step CVD method is developed to synthesize seamless in‐plane 1T'‐2H MoTe2 heterophase junctions with precise phase control and uniform large‐area coverage. The resulting transistors, incorporating 1T' MoTe2 contacts and 2H MoTe2 channels, exhibit ultralow contact resistance, offering a scalable solution to the long‐standing challenge of ...
Ye Lin +9 more
wiley +1 more source
Lightweight Hotspot Detection Model Fusing SE and ECA Mechanisms
MicromachinesIn this paper, we propose a lightweight lithography machine learning-based hotspot detection model that integrates the Squeeze-and-Excitation (SE) attention mechanism and the Efficient Channel Attention (ECA) mechanism.
Yanning Chen +8 more
doaj +1 more source