Results 61 to 70 of about 299,640 (375)

Organization of Block Copolymers using NanoImprint Lithography: Comparison of Theory and Experiments

, 2011
We present NanoImprint lithography experiments and modeling of thin films of block copolymers (BCP). The NanoImprint lithography is used to align perpendicularly lamellar phases, over distances much larger than the natural lamellar periodicity.
Bang J., Black C. T., Cheng J. Y., Chou S., Chuang V. P., David Andelman, Geisinger T., Ham S., Han E., Henri Orland, Hu Z., Jean Daillant, Kim H.-C., Kim S., Leibler L., Li H., Li H., Liu P. H., Man X. K., Mansky P., Matsen M. W., Pang-Hung Liu, Park S. M., Pascal Thébault, Patrick Guenoun, Pereira G. G., Petera D., Ruiz R., Ruiz R., Segalman R., Stefan Landis, Stein G. E., Stoykovich M., Sundrani D., Sundrani D., Tsori Y., Xingkun Man   +36 more
core   +1 more source

Characterization of PECVD Silicon Nitride Photonic Components at 532 and 900 nm Wavelength [PDF]

, 2014
Low temperature PECVD silicon nitride photonic waveguides have been fabricated by both electron beam lithography and 200 mm DUV lithography. Propagation losses and bend losses were both measured at 532 and 900 nm wavelength, revealing sub 1dB/cm ...
Baets, Roel, Chen, C, Claes, Tom, Deshpande, P, Dhakal, Ashim, Du Bois, B, Hasan, M Ul, Helin, P, Jansen, R, Lagae, L, Leyssens, K, Neutens, P, Peyskens, Frédéric, Rottenberg, X, Severi, S, Subramanian, Ananth, Van Dorpe, P   +16 more
core   +2 more sources

Hydroxypropyl cellulose photonic architectures by soft nanoimprinting lithography

Nature Photonics, 2018
As contamination and environmental degradation increase, there is a huge demand for new eco-friendly materials. Despite its use for thousands of years, cellulose and its derivatives have gained renewed interest as favourable alternatives to conventional ...
A. Espinha, Camilla Dore, C. Matricardi, M. Alonso, A. Goñi, A. Mihi   +5 more
semanticscholar   +1 more source

Optimized Strategy for Fabricating High‐Aspect‐Ratio Periodic Structures Over Large Areas Using ps‐Direct Laser Interference Patterning

Advanced Engineering Materials, EarlyView.
Picosecond direct laser interference patterning (DLIP) enables precise microstructure fabrication on stainless steel. Using a multiscan approach, high‐aspect‐ratio patterns are achieved. Fluence influences structure growth and homogeneity, with smaller periods yielding better uniformity.
Fabian Ränke, Marcelo Sallese, Marcos Soldera, Ignacio Tabares, Flavio Soldera, Andrés Fabián Lasagni   +5 more
wiley   +1 more source

Gaptronics: multilevel photonics applications spanning zero-nanometer limits

Nanophotonics, 2022
With recent advances in nanofabrication technology, various metallic gap structures with gap widths reaching a few to sub-nanometer, and even ‘zero-nanometer’, have been realized.
Jeong Jeeyoon, Kim Hyun Woo, Kim Dai-Sik
doaj   +1 more source

High‐Resolution Reverse Offset Printed Electroluminescent Multipixel Arrays for Scalable Future Wearable Displays

Advanced Engineering Materials, EarlyView.
This study explores the effects of pixel size and spacing when fabricating electroluminescent (EL) multipixel displays. COMSOL simulations identify the impact of pixel dimensions and spacing on electric field distribution and lighting efficiency. Flexible, high‐resolution EL pixel arrays are reverse offset printed, achieving a 96% reduction in pixel ...
Huanghao Dai, Yuxin Xia, Steve Beeby, Russel Torah   +3 more
wiley   +1 more source

Exploiting atomic layer deposition for fabricating sub-10 nm X-ray lenses

, 2018
Moving towards significantly smaller nanostructures, direct structuring techniques such as electron beam lithography approach fundamental limitations in feature size and aspect ratios.
Belkhou, Rachid, Bosgra, Jeroen, David, Christian, Döring, Florian, Fink, Rainer H., Guzenko, Vitaliy A., Kirk, Eugenie, Koch, Frieder, Meyer, Markus, Ornelas, Joshua L., Raabe, Jörg, Rösner, Benedikt, Stanescu, Stefan, Swaraj, Sufal, Watts, Benjamin   +14 more
core   +1 more source

3D-Nanomachining using corner lithography [PDF]

, 2008
We present a fabrication method to create 3D nano structures without the need for nano lithography. The method, named "corner lithography" is based on conformal deposition and subsequent isotropic thinning of a thin film.
Berenschot, J.W., Elwenspoek, M.C., Jansen, H.V., Tas, N.R.   +3 more
core   +2 more sources

Patterning Multicolor Hybrid Perovskite Films via Top-Down Lithography.

ACS Nano, 2019
Lead-halide perovskites have attracted great attention due to their excellent optoelectronic properties, with rapid progress being made in their performance as light-emitting diodes (LEDs), photodiodes, and solar cells.
J. Harwell, J. Burch, Alasdair H. Fikouras, M. Gather, A. Di Falco, I. Samuel   +5 more
semanticscholar   +1 more source

Nano‐Patterned CuO Nanowire Nanogap Hydrogen Gas Sensor with Voids

Advanced Functional Materials, Volume 35, Issue 12, March 18, 2025.
Sub‐5‐ppb hydrogen (H2) detection and sub‐10‐s response and recovery times are achieved based on nano‐patterned polycrystalline CuO nanowires nanogap gas sensors with voids using electron‐beam lithography and unique annealing processes. Pre‐H2 annealing, void‐generating oxidation, and downscaled nanogap electrodes are key to improving the sensing ...
Muqing Zhao, Ryosuke Nitta, Seiichiro Izawa, Jun‐ichi Yamaura, Yutaka Majima   +4 more
wiley   +1 more source