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Resist altamente inorganici a base di allumina patternabili tramite litografia UV e imprinting

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La tesi analizza le capacità di trasferimento di pattern nanometrici tramite litografia UV e imprinting per resist ibridi O/I a base di ...
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Geração de máscaras em escala nano e micrométrica por litografia eletrônica

2009
The electron beam lithography has been used to generate masks at nano and micrometric scale using polymeric films deposited on a substrate. The film is degraded by the electron beam at the desired regions and developed in a suitable solution. The result is a polymeric mask which can be used to generate on the substrate a region with the same geometric ...
Silva, Marcelo A. P.   +4 more
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