Results 11 to 20 of about 6,099,822 (216)
Lattice Boltzmann simulation of droplet behaviour in microfluidic devices [PDF]
, 2009 We developed a lattice Boltzmann model to investigate the droplet dynamics in microfluidic devices. In our model, a stress-free boundary condition was proposed to conserve the total mass of flow system and improve the numerical stability for flows with ...
Zhang, Yonghao, Liu, Haihu
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Dry etching and sputtering [PDF]
, 2003 Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W. +3 more
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Fundamental studies of combustion of droplet and vapour mixtures [PDF]
, 2010 There are few experimental data of a fundamental nature that clearly demonstrate the similarities and differences in burning rates between single phase and two phase combustion, either in laminar or turbulent conditions. Such data are essential towards a
Saat, Aminuddin
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Lattice Boltzmann simulation of droplet generation in a microfluidic cross-junction [PDF]
, 2011 Using the lattice Boltzmann multiphase model, numerical simulations have been performed to understand the dynamics of droplet formation in a microfluidic cross-junction.
Zhang, Yonghao, Liu, Haihu
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AIP Advances, 2023 We present the fabrication of strain-free quantum dots in the In0.53Ga0.47As/In0.52Al0.48As-system lattice matched to InP, as future sources for single and entangled photons for long-haul fiber-based quantum communication in the optical C-band.
D. Deutsch +4 more
doaj +1 more source
Phase-field modeling droplet dynamics with soluble surfactants [PDF]
, 2010 Using lattice Boltzmann approach, a phase-field model is proposed for simulating droplet motion with soluble surfactants. The model can recover the Langmuir and Frumkin adsorption isotherms in equilibrium.
Zhang, Y.H., Liu, H.
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ICP Etching of Silicon for Micro and Nanoscale Devices [PDF]
, 2010 The physical structuring of silicon is one of the cornerstones of modern microelectronics and integrated circuits. Typical structuring of silicon requires generating a plasma to chemically or physically etch silicon.
Henry, Michael David
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Droplet impact on a thin fluid layer [PDF]
, 2005 The initial stages of high-velocity droplet impact on a shallow water layer are described, with special emphasis given to the spray jet mechanics. Four stages of impact are delineated, with appropriate scalings, and the successively more important ...
Purvis, R +12 more
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Congruent evaporation temperature of molecular beam epitaxy grown GaAs (001) determined by local droplet etching [PDF]
Applied Physics Letters, 2015 The congruent evaporation temperature Tc of GaAs (001) is critical for many technological processes and is fundamental to the control and stability of Ga droplets for quantum structure fabrication. We apply the technique of local droplet etching (LDE) to measure Tc for technologically important molecular beam epitaxy (MBE) grown GaAs (001).
Heyn, Ch., Jesson, D. E.
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Concentrator cell methodology in the regeneration and recycle of chromium etching solutions using membrane technology [PDF]
, 2006 The regeneration of chromium (VI) and the recovery of etched copper from chromium etching solutions by electrodialysis is improved by the addition of a concentrator cell, using ion exchange resins or activated carbon cloth as concentrator media, in the ...
Ganguli, B, Grimes, SM, Chaudhary, AJ
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