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Alarm root cause analysis for water level monitoring in high and low pressure heaters of power plants

2017 Chinese Automation Congress (CAC), 2017
In order to ensure the safe and economic operations of thermal power plants, heater water levels of high pressure (HP) and low pressure (LP) heaters are important process variables to be monitored in industrial alarm systems. This paper proposes multiple factors affecting heater water levels, and the ways performing the root cause analysis for ...
Song Gao   +3 more
openaire   +1 more source

State of the Art and Trends in the Design and Operation of High- and Low-Pressure Heaters for Steam Turbines at Thermal and Nuclear Power Plants in Russia and Abroad: Part 2. Heater Design and Operation Peculiarities

Thermal Engineering, 2020
The modern state of the processes connected with design, calculation, and operation of heaters used in steam turbine regeneration systems is reviewed and analyzed on the basis of data available from domestically published and foreign sources. The existing methods for thermal–hydraulic, strength, and vibration design calculations of apparatuses are ...
Yu. M. Brodov   +5 more
openaire   +1 more source

Heater Chip with Different Microchannels Geometries for a Low Pressure Free Molecular Micro-Resistojet

2016
Space Systems ...
Cordeiro Guerrieri, D. (author)   +3 more
openaire   +1 more source

Application of variable-frequency electric drives for controlling the drain pumps of low-pressure heaters used in turbine units at cogeneration stations

Thermal Engineering, 2009
Results obtained from equipping the drain pumps of low-pressure heaters used in a T-250/300-23.8 turbine unit with a standard adjustable drive are presented. It is shown that the use of this drive allows the level in the high-pressure heater to be efficiently controlled in different modes of operation with smaller consumption of energy for station ...
openaire   +1 more source

Numerical Evaluation of the Hydrothermal Process in a Water-Surrounded Heater of Natural Gas Pressure Reduction Plants

Water (Switzerland), 2023
Mohsen Saffari Pour   +2 more
exaly  

Low Pressure Chemical Vapour Deposition of Silicon and Silicon Dioxide Thin Films for Thin Thermal Heater

2006
Low pressure chemical vapour deposition was used to deposit different silicon and silicon dioxide structures for thin film thermal heater by varying the working gas composition and substrate temperature. Silane gas diluted with argon was used to deposit silicon layers on different temperatures between 600 ^oC and 900 ^oC.
Biljanović, Petar   +8 more
openaire   +1 more source

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