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Research Progress of Titanium Nitride Thin Films Prepared by Magnetron Sputtering Technology [PDF]
Cailiao Baohu, 2023 Magnetron sputtering technology has significant advantages in the preparation of TiN films.Technological parameters have an obvious impact on the quality of films.This paper summarized the crystal structure，physical properties of TiN films and the ...
LI Chang-heng, LIU Kui-ren, WEI Shi-cheng, HAN Qing, WANG Bo, WANG Yu-jiang
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Energies, 2021 Plasma spraying and magnetron sputtering were used to form graphite–copper films on an n-type silicon surface. The main objective of this work was to compare the properties of the obtained graphite–copper Schottky photodiodes prepared using two different
Žydrūnas Kavaliauskas +8 more
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Российский технологический журнал, 2022 Objectives. When designing production equipment for the implementation of metal film deposition processes, the selection of technological sources for providing the required quality (structure, appearance), maximum process efficiency, and productivity ...
M. V. Nazarenko
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Advanced Science, 2021 Organic–inorganic halide perovskites have been widely used in photovoltaic technologies. Despite tremendous progress in their efficiency and stability, perovskite solar cells (PSCs) are still facing the challenges of upscaling and stability for practical
Bo Gao +9 more
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Materials Research Express, 2020 To improve the interfacial performance of carbon fiber (CF) and epoxy resin, the surface of CF was modified using magnetron sputtering technology, and a CF epoxy resin (CFER) composite was prepared using injection molding technology.
Li Yang +4 more
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Features Multilevel Metallization Forming a Submicron Structures of Large Integrated Circuits
Фізика і хімія твердого тіла, 2017 This paper analyzesaluminum alloys that are used to form multilevel metallization in the submicron LSI/VLSI and magnetic alloys that are used for the production of magnetic disks of external storage devices with a large amount of memory.
S. P. Novosyadlyj +2 more
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Feasible Route for a Large Area Few-Layer MoS2 with Magnetron Sputtering
Nanomaterials, 2018 In this article, we report continuous and large-area molybdenum disulfide (MoS2) growth on a SiO2/Si substrate by radio frequency magnetron sputtering (RFMS) combined with sulfurization. The MoS2 film was synthesized using a two-step method. In the first
Wei Zhong +6 more
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AIP Advances, 2021 The thrusts induced by the 45-mm-diameter DC and high power impulse magnetron sputtering [DC magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HiPIMS)] sources are assessed by using the pendulum thrust balance, where the ...
Kazunori Takahashi, Hidemasa Miura
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The Corrosion Resistance of Al Film on AZ31 Magnesium Alloys by Magnetron Sputtering
Metals, 2021 Nano Al films were prepared on AZ31 magnesium alloy samples by DC magnetron sputtering. The effects of sputtering power on the microstructure and corrosion resistance of the Al film were investigated. The results show that the surface of aluminum film is
Zhengyuan Gao +5 more
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Structure and optical properties of porous SiC film grown by magnetron sputtering on porous anodic aluminium oxide template [PDF]
Processing and Application of Ceramics, 2021 Porous fluorescent SiC films were deposited by magnetron sputtering (MS) using porous anodic aluminium oxide (AAO) template. In the first step AAO was carefully placed on the Si substrate and then coated with SiC film using magnetron sputtering at the ...
He Zhenhua +3 more
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