Results 11 to 20 of about 15,669 (219)

Compared to Performance of Ni / SiO2 Optical Attenuator by Two Preparing Methods

open access: yesMATEC Web of Conferences, 2016
In this paper, the preparation of Ni / SiO2 optical attenuator using two kinds of process, were discussed for electroless plating and magnetron sputtering technology, by analyzing Ni film appearance , surface morphology, film composition, SiO2 substrate ...
Dong Pengzhan   +3 more
doaj   +1 more source

Effects of Bottom Layer Sputtering Pressures and Annealing Temperatures on the Microstructures, Electrical and Optical Properties of Mo Bilayer Films Deposited by RF/DC Magnetron Sputtering

open access: yesApplied Sciences, 2019
Most of the molybdenum (Mo) bilayer films are deposited by direct current (DC) magnetron sputtering at the bottom and the top layer (DC/DC). However, the deposition of Mo bilayer film by radio frequency (RF) Mo bottom layer and DC Mo top layer magnetron ...
Haili Zhao, Jingpei Xie, Aixia Mao
doaj   +1 more source

DISCHARGE CHARACTERISTICS OF THE MAGNETRON SYSTEM FOR SPUTTERING, DEPOSITION, AND NANOTECHNOLOGY APPLICATIONS

open access: yesАвіаційно-космічна техніка та технологія, 2020
Magnetron sputtering is known for years as a powerful tool for coating deposition of cutting tools and machine parts. However the experimental measurements of the magnetron discharge parameters are still necessary to provide a consumer of the magnetron ...
Andrii Breus   +3 more
doaj   +1 more source

Preparation and research of structure-gradient and corrosion-resistant aluminium coatings on steel surface

open access: yesCailiao gongcheng, 2019
In order to control the composition and microstructure of corrosion-resistant aluminum coatings, a layer of pre-coating was deposited on Q235 steel surface by magnetron sputtering, and then corrosion-resistant aluminum coating with a certain thickness ...
WANG Yao   +6 more
doaj   +1 more source

Dependence of Optical Emission Spectra on Argon Gas Pressure during Modulated Pulsed Power Magnetron Sputtering (MPPMS)

open access: yesPlasma, 2021
Modulated pulsed power magnetron sputtering (MPPMS) of titanium was investigated as a function of argon gas pressure using optical emission spectroscopy (OES).
Masaomi Sanekata   +11 more
doaj   +1 more source

Magnetron Sputtering Preserves Solid Electrolyte Toughness after Shot Peening and Enhances Critical Current Density in Lithium-Metal Anode All-Solid-State Batteries

open access: yesElectrochemistry
To enable fast charging in lithium-metal anode all-solid-state batteries, the suppression of lithium dendrite formation at the solid electrolyte (SE) interface is critical.
Atsuro OKUMURA   +2 more
doaj   +1 more source

The Influence of Oxygen Pressure on ZnO:Al Thin Films Properties Grown Layer by Layer Growth Method at Magnetron Sputtering

open access: yesФізика і хімія твердого тіла, 2015
The influence of oxygen pressure in the deposition chamber on the structure, morphology, optical and electrical properties of aluminum doped ZnO films deposited by a layer by layer growth method in magnetron sputtering on glass substrates was studied ...
A. I. Evtushenko   +10 more
doaj   +1 more source

Effect of Ion Magnetron Sputtering Method on Scanning Electron Microscopy (SEM)Images of Materials with Different Surface Properties [PDF]

open access: yesCailiao Baohu
In order to investigate the effect of ion magnetron sputtering parameters on the scanning electron microscopy (SEM) images of nonconductive materials with different surface properties, the advantages and limitations of various ion magnetron sputtering ...
ZHANG Jie, ZOU Junwen, LIU Xueguang, LI Xiaoying
doaj   +1 more source

Investigation on structural and opto-electronic properties of substitutional Sn doped WS2 by co-sputtering technique

open access: yesJournal of Materials Research and Technology, 2021
The doping of two-dimensional materials provides them with tunable physical properties and broadens their application. In this study, the doping of tungsten disulfide with metallic Sn atoms via a co-sputtering technique was demonstrated.
Nabeel H. Alharthi   +5 more
doaj   +1 more source

Suppression of substrate temperature in DC magnetron sputtering deposition by magnetic mirror-type magnetron cathode

open access: yesAIP Advances, 2023
Magnetron sputtering generally increases the temperature of the substrate placed to face the sputtering target above 40 °C because the plasmas are transported through unbalanced magnetic field lines from the sputtering target to the substrate surface ...
Taisei Motomura   +4 more
doaj   +1 more source

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