Results 161 to 170 of about 12,456 (281)

Metal-Assisted Chemical etching for the direct synthesis of bimetallic Cu-Pd nanoparticles on silicon

, 2023
E. Torralba, Sylvain Le Gall, Harsh A. Chaliyawala, E. Chopard Eric Chopard, Zouhir Ait Rahhou, Diane Muller-Bouvet, Christine Cachet‐Vivier, Stéphane Bastide   +7 more
openalex   +1 more source

Wafer‐Scale Top‐Down Patterning of Metal Halide Perovskites

Advanced Materials Technologies, EarlyView.
Wafer‐scale patterning of metal halide perovskite films is demonstrated on 150 mm substrates using a chemically amplified resist, polymethyl methacrylate (CAR‐PMMA) and a single reactive ion etching step. The streamlined process preserves film luminescence while defining submicrometer features across the full wafer, enabling dense, scalable integration
Federico Fabrizi, Ardeshir Esteki, Holger Lerch, Saeed Goudarzi, Liudmila Starodubtceva, Gerhard Müller‐Newen, Maryam Mohammadi, Max C. Lemme   +7 more
wiley   +1 more source

Structural and Optical Properties of Silicon Nanowire Arrays Fabricated by Metal Assisted Chemical Etching With Ammonium Fluoride. [PDF]

Front Chem, 2018
Gonchar KA, Kitaeva VY, Zharik GA, Eliseev AA, Osminkina LA.   +4 more
europepmc   +1 more source

Analysis of metal-assisted chemical etching for microscale Si structures using Arrhenius method

Sunhae Choi, Haekyun Bong, K. Y. Kim, Sumin Jeon, Jungwoo Oh   +4 more
openalex   +2 more sources

Bi-Layer nanoimprinting lithography for metal-assisted chemical etching with application on silicon mold replication

, 2023
W.S. Chen, Yung-Chun Lee
openalex   +1 more source

Recent Advances in Light‐Addressable Electrochemistry for Spatially Resolved Applications

Advanced Materials Technologies, EarlyView.
This comprehensive review highlights light‐addressable electrochemistry as a powerful tool that uses light to control localized chemical reactions on unstructured semiconductor surfaces. The work evaluates advanced strategies to optimize electrode materials for enhanced spatial resolution and stability. Furthermore, it showcases diverse applications in
Nhi Trang Vo, Sina Jamali, Nam‐Trung Nguyen   +2 more
wiley   +1 more source

Black GaAs with Sub-Wavelength Nanostructures Fabricated via Lithography-Free Metal-Assisted Chemical Etching. [PDF]

ECS J Solid State Sci Technol, 2019
Wilhelm TS, Kolberg AP, Baboli MA, Abrand A, Bertness KA, Mohseni PK.   +5 more
europepmc   +1 more source

Effect of H2O2 Concentration on Morphology, Reflectivity and Wettability of Si Nanowalls Prepared by Metal Assisted Chemical Etching

, 2023
Anil Kumar Behara, R. N. Viswanath, Tom Mathews   +2 more
openalex   +1 more source

Chalcogen Alloy‐Engineered Te2Se/Si Heterojunctions for Low‐Noise Complementary Metal‐Oxide Semiconductor‐Compatible Short‐Wave Infrared Imaging

Advanced Optical Materials, EarlyView.
A Te2Se/Si heterojunction designed through atomistic simulations reduces oxide‐related traps, dark current, and noise compared with pure tellurium devices. This CMOS‐compatible platform enables short‐wave infrared detection and high‐contrast imaging in a 14 × 14 array, highlighting a scalable strategy for robust, low‐noise SWIR photodetectors and image
Byeongjin Park, Sieun Yun, Seock‐Jin Jeong, Euiyoung Choi, Min Cheol Kim, Jun Woo Kim, Seongmo Kang, Jiwoo Kim, Jongwon Yoon, Jaejun Jo, Hyun‐Soo Ra, Soon‐Yong Kwon, Han Seul Kim, Yonghun Kim   +13 more
wiley   +1 more source

Reaction control of metal-assisted chemical etching for silicon-based zone plate nanostructures. [PDF]

RSC Adv, 2018
Akan R, Parfeniukas K, Vogt C, Toprak MS, Vogt U.   +4 more
europepmc   +1 more source