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Electrochemical nanoimprint lithography: when nanoimprint lithography meets metal assisted chemical etching

Nanoscale, 2017
The functional three dimensional micro-nanostructures (3D-MNS) play crucial roles in integrated and miniaturized systems because of the excellent physical, mechanical, electric and optical properties. Nanoimprint lithography (NIL) has been versatile in the fabrication of 3D-MNS by pressing thermoplastic and photocuring resists into the imprint mold ...
Jie Zhang   +5 more
openaire   +2 more sources

Vertical silicon nanostructures via metal-assisted chemical etching

2017
Seyeong Lee   +3 more
openaire   +1 more source

3D Etching technology for single crystal silicon using Metal-Assisted Chemical Etching.

The Proceedings of Mechanical Engineering Congress, Japan
Satoshi Miyairi   +5 more
openaire   +1 more source

Metal-assisted chemical etching–based nanostructured silicon solar cells

2019
Fatima Toor   +3 more
openaire   +1 more source

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