Results 251 to 260 of about 12,456 (281)

Silicon Vias Fabricatied by Metal-Assisted Chemical Etching

2020 21st International Conference on Electronic Packaging Technology (ICEPT), 2020
As a bulk micromachining technology, the metal assisted chemical etching (MACE) is attractive for the application of silicon via fabrication, which is an important technology to realize the 3D stacked chip electrical interconnection in integrated circuit. In this paper, silver is used as catalyst to make an anisotropic wet etching of silicon bulk.
Hongbo Xu, Jianqiang Wang, Hongyun Zhao, Mingyu Li   +3 more
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Resolution limits of metal assisted chemical etching of polysilicon

2021
Patterning and etching high aspect ratio, sub-50 nanometer structures for 3D device architectures is becoming a critical challenge in advanced semiconductor device fabrication. Metal assisted chemical etching (MACE) is a wet etch process that has demonstrated very high aspect ratio structures in single crystal silicon at sub-50 nanometer scale.
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Metal-assisted chemical etching of silicon in HF–H2O2

Electrochimica Acta, 2008
Metal-assisted etching of silicon in HF/H2O2/H2O solutions with Ag nanoparticles as catalyst agents was investigated. SEM observations and etch rate measurements were carried out as a function of the etching solution composition. Depending on the relative amount of HF and H2O2, different regimes of dissolution take place and a strong similarity with ...
C. Chartier, S. Bastide, C. Lévy-Clément   +2 more
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ChemInform Abstract: Metal‐Assisted Chemical Etching of Silicon

ChemInform, 2011
AbstractReview: 121 refs.
Zhipeng Huang, Nadine Geyer, Peter Werner, Johannes de Boor, Ulrich Goesele   +4 more
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Mechanism of nanowire formation in metal assisted chemical etching

Electrochimica Acta, 2013
Abstract A simple, effective, and universal model is presented for the formation of silicon nanowires during silver metal assisted chemical etching of silicon. The model explains nanowire formation in terms of well-known and well-understood principles of electrochemical exchange current densities at silver metal/solution interfaces, silicon/silver ...
Zachary R. Smith, Rosemary L. Smith, Scott D. Collins   +2 more
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Mechanistic Characteristics of Metal-Assisted Chemical Etching in GaAs

The Journal of Physical Chemistry C, 2014
Because of the unique physical properties, various GaAs micro- and nanostructures have attracted increasing research attention for many technical applications such as solar cells, light-emitting diodes, and field-effect transistors. In this regard, numerous fabrication techniques have been explored, and among all, metal-assisted chemical etching is ...
Ho-Yuen Cheung, Hao Lin, Fei Xiu, Fengyun Wang, SenPo Yip, Johnny C. Ho, Chun-Yuen Wong   +6 more
openaire   +1 more source

Metal-Assisted Chemical Etching of Silicon for Photovoltaic Application

2019 IEEE 39th International Conference on Electronics and Nanotechnology (ELNANO), 2019
Silicon nanowires were obtained by means of metal-assisted chemical etching of silicon wafer. In this work, the effect of Ag-NP deposition time and etching time of silicon on the surface morphology, reflection spectra and photovoltaic characteristics of solar cells was studied.
Viktoriia Koval, Yuriy Yakymenko, Anatoliy Ivashchuk, Mykhailo Dusheyko, Oleksandr Masalskyi, Mykola Koliada, Dmytro Kulish   +6 more
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Uniform Metal-assisted Chemical Etching and the Stability of Catalysts

MRS Proceedings, 2015
ABSTRACTRecently, metal-assisted chemical etching (MaCE) has been demonstrated as a promising technology in fabrication of uniform high-aspect-ratio (HAR) micro- and nanostructures on silicon substrates. In this work, MaCE experiments on 2 μm-wide line patterns were conducted using Au or Ag as catalysts.
Liyi Li, Colin M. Holmes, Jinho Hah, Owen J. Hildreth, Ching P. Wong   +4 more
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Etching Volume Effect on the Morphology of Silicon Etched by Metal-Assisted Chemical Method

Applied Mechanics and Materials, 2012
Assisted by Ag nanoparticles, Si substrates were etched in aqueous solutions containing hydrofluoric acid (HF) and hydrogen peroxide (H2O2) with different volumes of etching solution. The etching morphology of Si wafers was found to be affected by the volumes.
Wei Wang, Li Juan Zhao, Ping Xin Song, Ying Jiu Zhang   +3 more
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Effect of catalyst shape on etching orientation in metal-assisted chemical etching of silicon

CrystEngComm, 2014
Silicon nanowires with vertical, slanting and zigzag architectures have been fabricated by metal-assisted chemical etching of silicon wafers ( n -Si(100), n -Si(111) and n -Si(110)).
Weiwei Xia, Jun Zhu, Haibo Wang, Xianghua Zeng   +3 more
openaire   +1 more source