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Metasurface Optic Features Using Metal-Assisted Chemical Etching (MACE)
ECS Meeting AbstractsMetal-assisted chemical etching (MACE or MacEtch) is a versatile method for fabricating nano and micro-structured silicon (Si), which has garnered significant attention due to its potential applications in photovoltaics, sensors, and nanoelectronics. The process involves the oxidation of Si in the presence of a metal catalyst (typically noble metals
Christopher St. John +2 more
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Metal assisted chemical etching for light emitting silicon nanowires
AIP Conference Proceedings, 2013The paper reports on the fabrication of vertically aligned silicon nanowire arrays using metal assisted chemical etching process of p-type silicon wafer. Microstructure has been investigated with scanning electron microscope and high resolution transmission electron microscope. Cathodoluminescence spectroscopy and imaging. have been used to investigate
S. Jana, S. R. Bhattacharyya
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Mechanistic Characteristics of Metal-Assisted Chemical Etching in GaAs
The Journal of Physical Chemistry C, 2014Because of the unique physical properties, various GaAs micro- and nanostructures have attracted increasing research attention for many technical applications such as solar cells, light-emitting diodes, and field-effect transistors. In this regard, numerous fabrication techniques have been explored, and among all, metal-assisted chemical etching is ...
Ho-Yuen Cheung +6 more
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Silicon nanowire photodetectors made by metal-assisted chemical etching
SPIE Proceedings, 2016Silicon nanowires have unique optical effects, and have potential applications in photodetectors. They can exhibit simple optical effects such as anti-reflection, but can also produce quantum confined effects. In this work, we have fabricated silicon photodetectors, and then post-processed them by etching nanowires on the incident surface.
Ying Xu, Chuan Ni, Andrew Sarangan
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Reducing manufacturing constraints of metal-assisted chemical etching
Integrated circuits, advanced sensors, and photovoltaics are just a subset of the technologies enabled by high throughput silicon nanomanufacturing. The manufacturing of these devices is not trivial. The dozens, if not hundreds, of processes that produce silicon-based devices impose limitations on subsequent steps. Inconsistencies and defects resultingopenaire +1 more source
Metal-Assisted Chemical Etching of GaAs Using Au Nanodots
ECS Meeting Abstracts, 2017III-V compound semiconductors have attracted attention as next-generation materials and potential alternatives to silicon-based semiconductors because of their excellent properties including superior carrier mobility and direct band gap. In a previous study, we fabricated microbump arrays of InP [1] and line patterns and pillar arrays of GaAs using ...
Ryota Imai +2 more
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Nanoscale, 2017
The functional three dimensional micro-nanostructures (3D-MNS) play crucial roles in integrated and miniaturized systems because of the excellent physical, mechanical, electric and optical properties. Nanoimprint lithography (NIL) has been versatile in the fabrication of 3D-MNS by pressing thermoplastic and photocuring resists into the imprint mold ...
Jie Zhang +5 more
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The functional three dimensional micro-nanostructures (3D-MNS) play crucial roles in integrated and miniaturized systems because of the excellent physical, mechanical, electric and optical properties. Nanoimprint lithography (NIL) has been versatile in the fabrication of 3D-MNS by pressing thermoplastic and photocuring resists into the imprint mold ...
Jie Zhang +5 more
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Producing Silicon Carbide Micro and Nanostructures by Plasma‐Free Metal‐Assisted Chemical Etching
Advanced Functional Materials, 2021Julian A Michaels +2 more
exaly
Metal-Assisted Chemical Etching of Mesoporous Silicon - Optical Properties
Silicon, 2023Parnian Alasti, Mahboubeh Houshiar
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