Results 241 to 250 of about 12,456 (281)

Bulk Micromachining of Si by Metal-assisted Chemical Etching

Small, 2014
Bulk micromachining of Si is demonstrated by the well‐known metal‐assisted chemical etching (MaCE). Si microstructures, having lateral dimension from 5 μm up to millimeters, are successfully sculpted deeply into Si substrate, as deep as >100 μm.
Dahl-Young Khang
exaly   +3 more sources

Vapor Phase Metal-Assisted Chemical Etching of Silicon

Advanced Functional Materials, 2014
This work introduces and explores vapor phase metal‐assisted chemical etching (VP‐MaCE) of silicon as a method to bypass some of the challenges found in traditional liquid phase metal‐assisted chemical etching (LP‐MaCE). Average etch rates for Ag, Au, and Pd/Au catalysts are established at 31, 70, and 96 nm/min respectively, and the relationship ...
Owen J Hildreth, Daniel R Schmidt
exaly   +2 more sources

Metal-Assisted Chemical Etching of Silicon: A Review

Advanced Materials, 2011
This article presents an overview of the essential aspects in the fabrication of silicon and some silicon/germanium nanostructures by metal-assisted chemical etching. First, the basic process and mechanism of metal-assisted chemical etching is introduced.
Johannes de Boor, Peter Werner, Ulrich Gösele   +2 more
exaly   +2 more sources

Metal Assisted Chemical Etch of Polycrystalline Silicon

Journal of Micro- and Nano-Manufacturing, 2022
Abstract Metal-assisted chemical etching (MacEtch) of silicon shows reliable vertical anisotropic wet etching only in single-crystal silicon, which limits its applications to a small number of devices. This work extends the capabilities of MacEtch to polysilicon which has potential to enable high-volume and cost-sensitive applications ...
Crystal Barrera, Paras Ajay, Akhila Mallavarapu, Mark Hrdy, S. V. Sreenivasan   +4 more
openaire   +1 more source

Vertical etching with isolated catalysts in metal-assisted chemical etching of silicon

Nanoscale, 2012
Metal assisted chemical etching with interconnected catalyst structures has been used to create a wide array of organized nanostructures. However, when patterned catalysts are not interconnected, but are isolated instead, vertical etching to form controlled features is difficult.
Lianto, P., Yu, S., Wu, J., Thompson, C.V., Choi, W.K.   +4 more
openaire   +2 more sources

Metal-assisted chemical etching of molybdenum disulphide

2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO), 2015
Large-scale two-dimensional (2D) electronics requires lithographic patterning of molybdenum disulphide (MoS2) into various nanostructures for device integration. However, fabrication of MoS2 nanostructures with well-defined edges remains challenging.
Wei Sun Leong, John T.L. Thong
openaire   +1 more source

On the Metal-Assisted Chemical Etching of Nanoporous Silicon

ECS Meeting Abstracts, 2012
Abstract not Available.
Dmitrii Goryachev, Ludvig Belyakov, Olga Yeltsina, Julia Vainshtein, Olga M. Sreseli   +4 more
openaire   +1 more source

Metal‐Assisted Chemical Etching of Silicon: A Review

Advanced Materials, 2010
AbstractThis article presents an overview of the essential aspects in the fabrication of silicon and some silicon/germanium nanostructures by metal‐assisted chemical etching. First, the basic process and mechanism of metal‐assisted chemical etching is introduced.
Zhipeng Huang, Nadine Geyer, Peter Werner, Johannes de Boor, Ulrich Gösele   +4 more
openaire   +1 more source

Direct Visualization of Etching Trajectories in Metal-Assisted Chemical Etching of Si by the Chemical Oxidation of Porous Sidewalls

Langmuir, 2015
We demonstrate a simple method for the visualization of trajectories traced by noble metal nanoparticles during metal-assisted chemical etching (MaCE) of Si. The nanoporous Si layer formed around drilled pores is converted into SiO2 by simple chemical oxidation. Etch removal of the remaining Si using alkali hydroxide leaves SiO2 nanostructures that are
Sung-Soo, Yoon, Dahl-Young, Khang
openaire   +2 more sources

GaAs Microarrays by Noble-Metal Assisted Chemical Etching

ECS Transactions, 2008
Microarrays of n-GaAs were fabricated for both (100) and (111) by colloidal crystal templating, ion sputtering and chemical etching using nanosized Au particles as the etching catalyst. Since self-organized polystyrene spheres were used as a mask, Au particles were selectively deposited at sites resulting in the formation of Au honeycomb pattern on ...
Yukiko Yasukawa, Hidetaka Asoh, Sachiko Ono   +2 more
openaire   +1 more source