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Formation of GaP nanocones and micro-mesas by metal-assisted chemical etching

Physical Chemistry Chemical Physics, 2016
Metal-assisted chemical etching (MaCE) of a (100) n-type GaP using patterned Pd catalysts in a mixed solution of HF and H 2 O 2 at room temperature is reported for the first time.
Jaehoon, Kim, Jihun, Oh
openaire   +2 more sources

(Invited) Light Enhanced Metal Assisted Chemical Etching of Silicon

ECS Meeting Abstracts, 2018
The study of electrochemicl porosification of silicon has allowed the production of different kinds of porosities in it, ranging from micropores to macropores, and directed by cristallographic planes, or electrical current lines. Additional studies have been on the use of different kinds of electrolytes, to etch faster, or with lower branching. Pore
Enrique Quiroga-González   +2 more
openaire   +1 more source

Carrier Dynamics in Si Nanowires Fabricated by Metal-Assisted Chemical Etching

ACS Nano, 2012
Silicon nanowire arrays fabricated by metal-assisted wet chemical etching have emerged as a promising architecture for solar energy harvesting applications. Here we investigate the dynamics and transport properties of photoexcited carriers in nanowires derived from an intrinsic silicon wafer using the terahertz (THz) time-domain spectroscopy.
Hao, Tang   +5 more
openaire   +2 more sources

Reducing manufacturing constraints of metal-assisted chemical etching

Integrated circuits, advanced sensors, and photovoltaics are just a subset of the technologies enabled by high throughput silicon nanomanufacturing. The manufacturing of these devices is not trivial. The dozens, if not hundreds, of processes that produce silicon-based devices impose limitations on subsequent steps. Inconsistencies and defects resulting
openaire   +1 more source

Metal-assisted chemical etching of Ge surface and its effect on photovoltaic devices

Applied Surface Science, 2016
Sangwoo Lim, Seunghyo Lee, Eunseok Oh
exaly  

Effects of the doping level in the production of silicon nanowalls by metal assisted chemical etching

Materials Science in Semiconductor Processing, 2020
Jolanta Światowska-Mrowiecka   +2 more
exaly  

Self-purification model for metal-assisted chemical etching of metallurgical silicon

Electrochimica Acta, 2014
Ralf B. Wehrspohn   +2 more
exaly  

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