Results 231 to 240 of about 51,422 (275)

Bulk Micromachining of Si by Metal‐assisted Chemical Etching

Small, 2014
Bulk micromachining of Si is demonstrated by the well‐known metal‐assisted chemical etching (MaCE). Si microstructures, having lateral dimension from 5 μm up to millimeters, are successfully sculpted deeply into Si substrate, as deep as >100 μm.
Sang-Mi, Kim, Dahl-Young, Khang
openaire   +4 more sources

Vapor Phase Metal‐Assisted Chemical Etching of Silicon

Advanced Functional Materials, 2014
This work introduces and explores vapor phase metal‐assisted chemical etching (VP‐MaCE) of silicon as a method to bypass some of the challenges found in traditional liquid phase metal‐assisted chemical etching (LP‐MaCE). Average etch rates for Ag, Au, and Pd/Au catalysts are established at 31, 70, and 96 nm/min respectively, and the relationship ...
Owen J. Hildreth, Daniel R. Schmidt
openaire   +3 more sources

Structuring of Si into Multiple Scales by Metal‐Assisted Chemical Etching

Advanced Materials, 2021
AbstractStructuring Si, ranging from nanoscale to macroscale feature dimensions, is essential for many applications. Metal‐assisted chemical etching (MaCE) has been developed as a simple, low‐cost, and scalable method to produce structures across widely different dimensions.
Ravi P. Srivastava, Dahl‐Young Khang
openaire   +4 more sources

Metal-assisted chemical etching of silicon: a review.

Advanced materials (Deerfield Beach, Fla.), 2011
This article presents an overview of the essential aspects in the fabrication of silicon and some silicon/germanium nanostructures by metal-assisted chemical etching. First, the basic process and mechanism of metal-assisted chemical etching is introduced.
Zhipeng, Huang, Nadine, Geyer, Peter, Werner, Johannes, de Boor, Ulrich, Gösele   +4 more
openaire   +3 more sources

Metal Assisted Chemical Etch of Polycrystalline Silicon

Journal of Micro- and Nano-Manufacturing, 2022
Abstract Metal-assisted chemical etching (MacEtch) of silicon shows reliable vertical anisotropic wet etching only in single-crystal silicon, which limits its applications to a small number of devices. This work extends the capabilities of MacEtch to polysilicon which has potential to enable high-volume and cost-sensitive applications ...
Crystal Barrera, Paras Ajay, Akhila Mallavarapu, Mark Hrdy, S. V. Sreenivasan   +4 more
openaire   +1 more source

Silicon Vias Fabricatied by Metal-Assisted Chemical Etching

2020 21st International Conference on Electronic Packaging Technology (ICEPT), 2020
As a bulk micromachining technology, the metal assisted chemical etching (MACE) is attractive for the application of silicon via fabrication, which is an important technology to realize the 3D stacked chip electrical interconnection in integrated circuit. In this paper, silver is used as catalyst to make an anisotropic wet etching of silicon bulk.
Hongbo Xu, Jianqiang Wang, Hongyun Zhao, Mingyu Li   +3 more
openaire   +1 more source

Metal-assisted chemical etching of molybdenum disulphide

2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO), 2015
Large-scale two-dimensional (2D) electronics requires lithographic patterning of molybdenum disulphide (MoS2) into various nanostructures for device integration. However, fabrication of MoS2 nanostructures with well-defined edges remains challenging.
Wei Sun Leong, John T.L. Thong
openaire   +1 more source

Vertical etching with isolated catalysts in metal-assisted chemical etching of silicon

Nanoscale, 2012
Metal assisted chemical etching with interconnected catalyst structures has been used to create a wide array of organized nanostructures. However, when patterned catalysts are not interconnected, but are isolated instead, vertical etching to form controlled features is difficult.
Lianto, P., Yu, S., Wu, J., Thompson, C.V., Choi, W.K.   +4 more
openaire   +2 more sources

GaAs Microarrays by Noble-Metal Assisted Chemical Etching

ECS Transactions, 2008
Microarrays of n-GaAs were fabricated for both (100) and (111) by colloidal crystal templating, ion sputtering and chemical etching using nanosized Au particles as the etching catalyst. Since self-organized polystyrene spheres were used as a mask, Au particles were selectively deposited at sites resulting in the formation of Au honeycomb pattern on ...
Yukiko Yasukawa, Hidetaka Asoh, Sachiko Ono   +2 more
openaire   +1 more source