Results 11 to 20 of about 56,675 (350)
Wafer-Scale Integration for Semi-Flexible Neural Implant Miniaturization
Proceedings, 2018 We present a novel, wafer-based fabrication process that enables integration and assembly of electronic components, such as ASICs and decoupling capacitors, with flexible interconnects.
Marta Kluba +5 more
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Microfabrication of Laser-Driven Accelerator Structures [PDF]
, 2002 We discuss the potential for using microfabrication techniques for laser-driven accelerator construction. We introduce microfabrication processes in general, and then describe our investigation of a particular trial process.
Cowan, Benjamin
core +2 more sources
Nano-Focusing and Leveling System Based on Improved Phase Analysis
IEEE Photonics Journal, 2016 A nano-focusing and leveling system (FLS) based on improved phase analysis is proposed to measure the wafer height in lithography. Different from traditional methods, this paper applies a grating-based mark to conduct the measurement according to the ...
Yan Tang +5 more
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Moiré-Based Interferometry for Magnification Calibration of Bitelecentric Lens System
IEEE Photonics Journal, 2015 The bitelecentric lens system is widely used in many domains, such as 3-D measurements and tube inspection. The magnification calibration for such a system is a crucial problem for its further application in achieving precise measurements. However, it is
Yi Zhou +5 more
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Microfabricated ion traps [PDF]
Contemporary Physics, 2011 Ion traps offer the opportunity to study fundamental quantum systems with high level of accuracy highly decoupled from the environment. Individual atomic ions can be controlled and manipulated with electric fields, cooled to the ground state of motion with laser cooling and coherently manipulated using optical and microwave radiation.
Hughes, Marcus D. +3 more
openaire +2 more sources
Dual-Channel Light Intensity Modulation Method for Focusing in Projection Lithography
IEEE Photonics Journal, 2016 Focusing technique is the key factor in improving the resolution of projection lithography. In order to achieve high accuracy of focusing on the nanometer level, we present a focusing method based on dual-channel light intensity modulation.
Yanli Li +4 more
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Nano-Micro Letters, 2023 Highlights Imine groups in covalent organic framework (COF) films act as dual-active sites for humidity sensing, inducing an intrinsic enhanced mechanism of reversible protonated tautomerism via water molecule-induced hydrogen bonding.
Xiyu Chen +11 more
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Lithographic band gap tuning in photonic band gap crystals [PDF]
, 1996 We describe the lithographic control over the spectral response of three-dimensional photonic crystals. By precise microfabrication of the geometry using a reproducible and reliable procedure consisting of electron beam lithography followed by dry ...
Arbet-Engels, V. +3 more
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A Moiré-Based Four-Channel Focusing and Leveling Scheme for Projection Lithography
IEEE Photonics Journal, 2014 Focusing and leveling are two imperative processes to adjust the wafer onto the ideal focal plane of projection lithography tools. Based on moiré fringes formed by particularly designed dual-grating marks, the four-channel focusing and leveling ...
Chengliang Di +6 more
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Influence of Collimation on Alignment Accuracy in Proximity Lithography
IEEE Photonics Journal, 2014 The alignment method based on moiré imaging has been wildly used for its high accuracy of physical measurement, which utilized the phase of moiré fringe to measure the relative linear displacement between the mask and the wafer.
Nan Wang +6 more
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