Results 181 to 190 of about 4,233 (222)

Measuring the Future – Nanometrology for Advanced Manufacturing of Miniaturized Devices

Advanced Functional Materials
Nanometrology is a cornerstone of modern manufacturing and pivotal in enabling precise measurements as well as materials characterization at the micro‐ and nano‐scale.
Madhurya Chandel, Andreas Rosenkranz, Daniel Moraru, Adam Woźniak, A. Jastrzębska   +4 more
semanticscholar   +1 more source

Computational methods in nanometrology: the challenges of resolution and stochasticity

Frontiers in Nanotechnology
Nanometrology is vital for the advancement of nanotechnology but faces significant computational demands due to the complexity of measurements at the nanoscale.
A. Kondi, Efi-Maria Papia, E. Stai, V. Constantoudis   +3 more
semanticscholar   +1 more source

Nanometrological micromachined artefacts

Journal of Micromechanics and Microengineering, 1992
The fabrication of some unique artefacts with critical dimensions from deep submicron to several microns is described. These have been fabricated in silicon, in phosphosilicate glass (PSG) and in polysilicon films. The thermal reflow properties of PSG have been used to obtain artefacts with smooth spherical and cylindrical surfaces and the phosphorus ...
Ensell, G., Evans, A.G.R., Farooqui, M., Stedman, M., Haycocks, J.A.   +4 more
openaire   +1 more source

Comparing bottom–up and top–down SI traceability approaches in dimensional nanometrology: reference material measurements using transmission electron microscopy and atomic force microscopy

Measurement science and technology
The lattice spacing of Si has recently been established as the mise en pratique (MeP) of the SI definition of the metre. These developments may influence the dimensional nanometrology, particularly when implemented in the measurements of semiconductor ...
R. Kizu, Keita Kobayashi
semanticscholar   +1 more source

Nanometrology assisted chemical fabrication: direct laser writing of porphyrins onto complex surfaces.

Nanoscale
The association of operando monitoring methodologies with micro and nanoscale surface modification strategies has recently been shown to enable the preparation of complex yet highly precise organic functional surfaces.
Baptiste Maillot, Haroon Rashid, R. Bercy, J. Audibert, M. Llansola‐Portoles, Isabelle Leray, Fabien Miomandre, Vitor Brasiliense   +7 more
semanticscholar   +1 more source

High-precision tip-based nanofabrication and nanometrology in extended macroscopic working areas

Advanced Lithography
This paper introduces the Nano Fabrication Machine (NFM-100), a state-of-the-art system with a working range of up to 100mm in diameter, equipped with an integrated tip-based system, which serves both as an atomic force microscope (AFM) and as a tool for
J. Stauffenberg
semanticscholar   +1 more source

Etalon for Nanometrology Produced by Anisotropic Etching

Nano- i Mikrosistemnaya Tehnika, 2021
Possibilities and results of using relief structures produced by anisotropic etching as etalons for linear measurements in nanorange are discussed. Two types of the structures with different profiles and with two approaches to estimation of influence of ...
Y. Larionov
semanticscholar   +1 more source

Plasmonic Lens for Nanometrology

Key Engineering Materials, 2010
In this paper, we presented plasmonic lens using metallic nanostructures to manipulate light based on surface plasmon polaritons for subwavelength focusing and collimation. We then proposed the use of plasmonic lens in the field of nanophotonics as a micro-photonic-device for nanometrology and sensing/detection purposes.
Jun Wang, Wei Zhou
openaire   +1 more source

Nanometrology for industrial applications

e & i Elektrotechnik und Informationstechnik, 1998
The development of continuously decreasing workpiece tolerances lies in one line with the perspective of nanotechnology. To fulfil metrological demands since about 1982 new high resolution and high precision measuring devices have been developed. These are computerized instruments and the measuring results are very illustrative figures of tested ...
D. Prostrednik, P. H. Osanna
openaire   +1 more source

Bayesian inference for plasmonic nanometrology

Physical Review A, 2021
We introduce a Bayesian method for the characterization of plasmonic nanoparticles, which is applicable to both near- and far-field problems. Designed to combine data generated from any photon-plasmon interaction experiment with physically motivated theoretical models, our approach leverages state-of-the-art Markov chain Monte Carlo sampling techniques
Joseph M. Lukens, Ali Passian
openaire   +1 more source